Structure and properties of nanoscale MoN/CrN multilayered coatings

M. Lisovenko, O. Bondar, M. Opielak, V. Beresnev, P. Konarski, R. Sakenova, S. Konstantinov, F. Komarov
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引用次数: 1

Abstract

Multilayered nanostructured coatings consisting of MoN and CrN alternating layers have been considered. The coatings obtained by arc-vacuum deposition in 3 series with different bias potential. The thickness of bilayers has been varied from micro (1.73 μm) to nanosizes (36÷41 nm). Parameters of deposition have been changed, such as bias potential from −20 V to −300 V and chamber pressure from 7×10−4 to 3×10−3 Torr. An element and structural analysis performed with XRD, SEM (with EDS), RBS, SIMS methods has shown well properties of obtained coatings, with clearly allocated layers of CrN and MoN. It is found formation of mononitride CrN and Mo2N with cubic lattice NaCl-type. Decreasing of bilayers thickness to (36÷41) nm has provided high hardness (38÷42) GPa and wear resistance. Remarkable that increasing of chamber pressure leads to increase of wear resistance.
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纳米MoN/CrN多层涂层的结构与性能
本文研究了由MoN和CrN交替层组成的多层纳米结构涂层。采用电弧真空沉积法制备了3个系列不同偏压电位的镀层。双层膜的厚度从微米(1.73 μm)到纳米(36÷41 nm)不等。沉积参数发生了变化,如偏置电位从−20 V到−300 V,腔压从7×10−4到3×10−3 Torr。采用XRD、SEM (EDS)、RBS、SIMS等方法对镀层进行了元素分析和结构分析,结果表明所制备的涂层具有良好的性能,CrN和MoN层分布清晰,形成了立方晶格nacl型的单氮化物CrN和Mo2N。将双层层厚度降低到(36÷41) nm,具有较高的硬度(38÷42) GPa和耐磨性。值得注意的是,腔室压力的增加导致耐磨性的增加。
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