Substrate network modeling of RF Power LDMOS devices including nonlinear effects

O. Tornblad, L. Giffin, C. Blair
{"title":"Substrate network modeling of RF Power LDMOS devices including nonlinear effects","authors":"O. Tornblad, L. Giffin, C. Blair","doi":"10.1109/MWSYM.2016.7540395","DOIUrl":null,"url":null,"abstract":"Substrate network modeling of RF Power LDMOS devices is important for accurate modeling at higher frequencies. Substrate losses can account for a considerable amount of the losses in the device and directly affects the efficiency, which is one of the most critical performance criteria of a power amplifier. In this paper, an improved substrate network model for RF Power LDMOS devices is presented that can more accurately predict these losses and be of help in designing improved device structures. Nonlinear resistors representing a depleting drain to body junction as a function of drain to source bias are included in a physical way. It is shown that the model gives good agreement with s-parameters for varying LDD lengths and as a function of drain to source bias.","PeriodicalId":6554,"journal":{"name":"2016 IEEE MTT-S International Microwave Symposium (IMS)","volume":"53 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2016-08-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE MTT-S International Microwave Symposium (IMS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MWSYM.2016.7540395","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract

Substrate network modeling of RF Power LDMOS devices is important for accurate modeling at higher frequencies. Substrate losses can account for a considerable amount of the losses in the device and directly affects the efficiency, which is one of the most critical performance criteria of a power amplifier. In this paper, an improved substrate network model for RF Power LDMOS devices is presented that can more accurately predict these losses and be of help in designing improved device structures. Nonlinear resistors representing a depleting drain to body junction as a function of drain to source bias are included in a physical way. It is shown that the model gives good agreement with s-parameters for varying LDD lengths and as a function of drain to source bias.
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包含非线性效应的射频功率LDMOS器件基板网络建模
射频功率LDMOS器件的衬底网络建模对于在更高频率下精确建模非常重要。衬底损耗在器件损耗中占相当大的比例,并直接影响效率,这是功率放大器最关键的性能标准之一。本文提出了一种改进的射频功率LDMOS器件衬底网络模型,可以更准确地预测这些损耗,并有助于设计改进的器件结构。非线性电阻表示耗尽漏极到体结作为漏极到源偏置的函数,以物理方式包括在内。结果表明,该模型与不同LDD长度的s参数和漏源偏置的函数具有很好的一致性。
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