Practical wafer Level Threshold Voltage Stability measurement methodology for the fast evaluation of Flash technology

G. Niu, W. Chien, Jack Chen, Dennis Zhang, Susie Yu, Daniel Zhao, Silvia Duan, Ming Li, Alicia Ding
{"title":"Practical wafer Level Threshold Voltage Stability measurement methodology for the fast evaluation of Flash technology","authors":"G. Niu, W. Chien, Jack Chen, Dennis Zhang, Susie Yu, Daniel Zhao, Silvia Duan, Ming Li, Alicia Ding","doi":"10.1109/CSTIC.2017.7919852","DOIUrl":null,"url":null,"abstract":"Package Level Threshold Voltage Stability (VTS) evaluation on PMOS has emerged as one of the critical reliability concerns in deep sub-micron devices. In this paper, we present a novel method to fast measure VTS at wafer level. Our result shows that changing the Source/Drain IMP species can improve the VTS of a 0.13um Flash.","PeriodicalId":6846,"journal":{"name":"2017 China Semiconductor Technology International Conference (CSTIC)","volume":"42 1","pages":"1-3"},"PeriodicalIF":0.0000,"publicationDate":"2017-03-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2017 China Semiconductor Technology International Conference (CSTIC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSTIC.2017.7919852","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

Abstract

Package Level Threshold Voltage Stability (VTS) evaluation on PMOS has emerged as one of the critical reliability concerns in deep sub-micron devices. In this paper, we present a novel method to fast measure VTS at wafer level. Our result shows that changing the Source/Drain IMP species can improve the VTS of a 0.13um Flash.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
用于快速评估Flash技术的实用晶圆级阈值电压稳定性测量方法
PMOS的封装级阈值电压稳定性(VTS)评估已成为深亚微米器件可靠性的关键问题之一。本文提出了一种在晶圆级快速测量VTS的新方法。结果表明,改变源源/漏源IMP种类可以提高0.13um闪光的VTS。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Wafer size MOS2 with few monolayer synthesized by H2S sulfurization A fast and low-cost TSV/TGV filling method Finger print sensor molding thickness none destructive measurement with Terahertz technology Research of SMO process to improve the imaging capability of lithography system for 28nm node and beyond The study on the moldability and reliability of epoxy molding compound
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1