Synthesis of NiO for various optoelectronic applications

Jungho Kim, Ji-Weon Kim
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Abstract

Oxide semiconductors have developed rapidly in a short period of time in various industrial fields due to their ability to be easily manufactured at low temperatures and recoverability of electrical properties. Among these oxide semiconductors, nickel oxide (NiO) is one of the most studied transition metal oxides. NiO is a p-type semiconductor with a wide band gap at room temperature, and has advantages of low toxicity, low cost, and excellent stability. Due to these advantages, NiO is widely used in various industrial fields such as gas sensors. In this paper, various synthesis methods of NiO will be briefly reviewed. Such synthesis methods include organic solvent methods, chemical vapor deposition methods, sol-gel methods, and chemical solution deposition methods. Materials required for each synthesis method, experimental methods, post-processing, and experimental results are briefly described.
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用于各种光电应用的NiO的合成
氧化物半导体由于其易于低温制造和电性能的可恢复性,在短时间内迅速发展到各个工业领域。在这些氧化物半导体中,氧化镍(NiO)是研究最多的过渡金属氧化物之一。NiO是一种在室温下具有宽带隙的p型半导体,具有低毒性、低成本和优异的稳定性等优点。由于这些优势,蔚来汽车被广泛应用于气体传感器等各个工业领域。本文将对NiO的各种合成方法进行综述。这些合成方法包括有机溶剂法、化学气相沉积法、溶胶-凝胶法和化学溶液沉积法。简要介绍了每种合成方法所需的材料、实验方法、后处理和实验结果。
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