S. Krey, F. Peter, E. Dumitrescu, W. D. van Amstel, R. G. Klaver, E. Lous
{"title":"Wafer topography measurement by fast optical scanning deflectometry","authors":"S. Krey, F. Peter, E. Dumitrescu, W. D. van Amstel, R. G. Klaver, E. Lous","doi":"10.1109/CLEOE.2003.1313528","DOIUrl":null,"url":null,"abstract":"Fast optical scanning deflectometry has been introduced for the measurement of the surface figure of optical surfaces. The measurement principle is based on physical ray tracing by means of a narrow laser beam deflected by an oscillating mirror and a large lens arranged for telecentric scanning. A new design of an instrument capable of measuring 12-inch wafers within 60 s and with a slope resolution better 1 /spl mu/rad is presented.","PeriodicalId":6370,"journal":{"name":"2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666)","volume":"12 1","pages":"465-"},"PeriodicalIF":0.0000,"publicationDate":"2003-06-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2003 Conference on Lasers and Electro-Optics Europe (CLEO/Europe 2003) (IEEE Cat. No.03TH8666)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEOE.2003.1313528","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Fast optical scanning deflectometry has been introduced for the measurement of the surface figure of optical surfaces. The measurement principle is based on physical ray tracing by means of a narrow laser beam deflected by an oscillating mirror and a large lens arranged for telecentric scanning. A new design of an instrument capable of measuring 12-inch wafers within 60 s and with a slope resolution better 1 /spl mu/rad is presented.
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