Simultaneous high thermoelectric and photocatalytic performance towards single-layer ZnX2S4 (X = Al, Ga, In)

IF 5.9 3区 材料科学 Q2 CHEMISTRY, PHYSICAL FlatChem Pub Date : 2023-11-01 DOI:10.1016/j.flatc.2023.100569
Jun Cheng , Xiao-Xiao Rao , Wen-Yu Fang , Xiao-Fei Sheng , Lei Bao
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Abstract

Thermoelectric generation and photocatalytic water splitting to produce hydrogen are key measures to solve energy shortage and environmental pollution. In this work, we proposed three unexplored 2D materials, ZnAl2S4, ZnGa2S4 and ZnIn2S4, and further investigated their stability, thermoelectric and photocatalytic water splitting performance. We revealed the three single-layers possess low cleavage energies of 0.23–0.28 J/m2, and simultaneously show high mechanical, thermal and dynamic stability. Besides, the single-layers are indirect semiconductors with band-gaps of 2.62/2.15/1.93 eV, and deliver thermoelectric power factors of 3.03/4.06/5.92 mW/K2m at 300 K. Also, due to the high nonlinear phonon dispersion and strong acoustic-optical interactions, they have high phonon scattering rates, as well as low lattice thermal conductivities of 1.11–3.06 W/mK. As a result, their thermoelectric figure of merit can reach 0.12/0.11/0.10 at 300 K, and increases to 0.77/0.69/0.66 at 700 K. Moreover, they also have suitable REDOX band-edges, which can drive photocatalytic water splitting to produce hydrogen and oxygen, and show high absorption coefficients of ∼ 105 cm−1 from visible to ultraviolet.

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单层ZnX2S4 (X = Al, Ga, In)同时具有高热电和光催化性能
热电发电和光催化水裂解制氢是解决能源短缺和环境污染的关键措施。在这项工作中,我们提出了三种未开发的二维材料ZnAl2S4, ZnGa2S4和ZnIn2S4,并进一步研究了它们的稳定性,热电和光催化分解水的性能。结果表明,这三种单层材料具有较低的解理能(0.23 ~ 0.28 J/m2),同时具有较高的力学稳定性、热稳定性和动力稳定性。此外,单层为间接半导体,带隙为2.62/2.15/1.93 eV, 300 K时热电功率因数为3.03/4.06/5.92 mW/K2m。此外,由于高非线性声子色散和强声光相互作用,它们具有高声子散射率,以及1.11-3.06 W/mK的低晶格热导率。因此,它们的热电优值在300 K时可以达到0.12/0.11/0.10,在700 K时增加到0.77/0.69/0.66。此外,它们还具有合适的氧化还原带边缘,可以驱动光催化水分解产生氢和氧,并且从可见光到紫外线显示出高的吸收系数~ 105 cm−1。
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来源期刊
FlatChem
FlatChem Multiple-
CiteScore
8.40
自引率
6.50%
发文量
104
审稿时长
26 days
期刊介绍: FlatChem - Chemistry of Flat Materials, a new voice in the community, publishes original and significant, cutting-edge research related to the chemistry of graphene and related 2D & layered materials. The overall aim of the journal is to combine the chemistry and applications of these materials, where the submission of communications, full papers, and concepts should contain chemistry in a materials context, which can be both experimental and/or theoretical. In addition to original research articles, FlatChem also offers reviews, minireviews, highlights and perspectives on the future of this research area with the scientific leaders in fields related to Flat Materials. Topics of interest include, but are not limited to, the following: -Design, synthesis, applications and investigation of graphene, graphene related materials and other 2D & layered materials (for example Silicene, Germanene, Phosphorene, MXenes, Boron nitride, Transition metal dichalcogenides) -Characterization of these materials using all forms of spectroscopy and microscopy techniques -Chemical modification or functionalization and dispersion of these materials, as well as interactions with other materials -Exploring the surface chemistry of these materials for applications in: Sensors or detectors in electrochemical/Lab on a Chip devices, Composite materials, Membranes, Environment technology, Catalysis for energy storage and conversion (for example fuel cells, supercapacitors, batteries, hydrogen storage), Biomedical technology (drug delivery, biosensing, bioimaging)
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