SiH4+H⇋SiH3+H2的高温实验

A. Kunz, P. Roth
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引用次数: 7

摘要

在998 ~ 1273 K的温度和1.5 bar的压力下,研究了硅烷与H原子在反射激波下的反应。几ppm的碘化乙酯(C2H5I)的热分解被用作众所周知的氢原子源。原子共振吸收光谱(ARAS)用于时间分辨和同时测量氢和硅原子浓度。根据反应(r5),过量SiH4的存在导致H原子的快速消耗。基于简化反应机理的计算机模拟对所获得的信号进行了动力学评价。得到反应速率系数r5为:
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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A high temperature study of the reaction SiH4+H ⇋ SiH3+H2

The reaction of silane with H atoms

was studied behind reflected shock waves at temperatures between 998 K and 1273 K and pressures around 1.5 bar. The thermal decomposition of a few ppm ethyl iodide (C2H5I) was used as a well known H-atom source. The atomic resonance absorption spectroscopy (ARAS) was applied for time resolved and simultaneous measurements of H- and Si-atom concentrations. The presence of an excess of SiH4 causes a fast consumption of H atoms according to reaction (R 5). The signals obtained were kinetically evaluated by computer simulations based on a simplified reaction mechanism. The rate coefficient for reaction (R 5) was found to be:

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