电迁移促进了焊点中金属间化合物的生长

H. Ceric, A. Singulani, R. L. de Orio, S. Selberherr
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引用次数: 0

摘要

焊点是三维(3D)集成的重要互连元件。它们的机械和电气性能影响3D集成电路的整体可靠性。焊料凸起的一个特殊特征是在工艺加工和使用过程中,其材料成分会发生变化。这种成分转换影响3D集成电路的运行,并且与电迁移有关,可能导致故障。我们提出了一个模型来描述在电迁移的影响下凸点内金属间化合物的生长。并结合实验结果讨论了基于该模型的仿真结果。
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Electromigration enhanced growth of intermetallic compound in solder bumps
Solder bumps are important interconnect components for three-dimensional (3D) integration. Their mechanical and electrical properties influence the overall reliability of 3D ICs. A particular characteristic of solder bumps is that during technology processing and usage their material composition changes. This compositional transformation influences the operation of 3D ICs and, in connection with electromigration, may cause failures. We present a model for describing the growth of intermetallic compound inside a solder bump under the influence of electromigration. Simulation results based on our model are discussed in conjunction with corresponding experimental findings.
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