沉积条件对氧化钛薄膜性能的影响

M. Pustan, C. Bîrleanu, A. Trif, S. Garabagiu, D. Marconi, L. Barbu-Tudoran
{"title":"沉积条件对氧化钛薄膜性能的影响","authors":"M. Pustan, C. Bîrleanu, A. Trif, S. Garabagiu, D. Marconi, L. Barbu-Tudoran","doi":"10.1109/SMICND.2018.8539738","DOIUrl":null,"url":null,"abstract":"This paper presents the fabrication and characterization of titanium oxide thin films deposited by Pulsed Laser Deposition in different experimental conditions. The scope of this work is to investigate the effect of the oxygen pressure in the deposition chamber on the material properties. Thin films characterizations include the mechanical and tribological properties such as the modulus of elasticity, hardness and the adhesion force. The mechanical and tribological properties of the materials are experimentally determined by using the atomic force microscopy technique. The effect of the oxygen pressure on the film thickness is analyzed. As the pressure in the deposition process decreases, the thickness of the thin films increases, respectively. The surfaces roughness increases as the deposition pressure decreases that leads to a decrease of adhesion forces. Hardness and modulus of elasticity increases as the deposition pressure decreases. This study shows that the mechanical and tribological properties of the investigated thin films strongly depend on the grain size and the films density, which are influenced by the deposition conditions (the oxygen pressure in the deposition chamber).","PeriodicalId":247062,"journal":{"name":"2018 International Semiconductor Conference (CAS)","volume":"51 28","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Effect of the Deposition Conditions on Titanium Oxide Thin Films Properties\",\"authors\":\"M. Pustan, C. Bîrleanu, A. Trif, S. Garabagiu, D. Marconi, L. Barbu-Tudoran\",\"doi\":\"10.1109/SMICND.2018.8539738\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents the fabrication and characterization of titanium oxide thin films deposited by Pulsed Laser Deposition in different experimental conditions. The scope of this work is to investigate the effect of the oxygen pressure in the deposition chamber on the material properties. Thin films characterizations include the mechanical and tribological properties such as the modulus of elasticity, hardness and the adhesion force. The mechanical and tribological properties of the materials are experimentally determined by using the atomic force microscopy technique. The effect of the oxygen pressure on the film thickness is analyzed. As the pressure in the deposition process decreases, the thickness of the thin films increases, respectively. The surfaces roughness increases as the deposition pressure decreases that leads to a decrease of adhesion forces. Hardness and modulus of elasticity increases as the deposition pressure decreases. This study shows that the mechanical and tribological properties of the investigated thin films strongly depend on the grain size and the films density, which are influenced by the deposition conditions (the oxygen pressure in the deposition chamber).\",\"PeriodicalId\":247062,\"journal\":{\"name\":\"2018 International Semiconductor Conference (CAS)\",\"volume\":\"51 28\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 International Semiconductor Conference (CAS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMICND.2018.8539738\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 International Semiconductor Conference (CAS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.2018.8539738","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

本文介绍了在不同实验条件下脉冲激光沉积氧化钛薄膜的制备和表征。这项工作的范围是研究沉积室中氧气压力对材料性能的影响。薄膜的表征包括机械和摩擦学性能,如弹性模量、硬度和附着力。利用原子力显微镜技术对材料的力学性能和摩擦学性能进行了实验测定。分析了氧压对膜厚的影响。随着沉积过程中压力的减小,薄膜的厚度分别增大。表面粗糙度随着沉积压力的减小而增大,从而导致附着力的减小。硬度和弹性模量随沉积压力的减小而增大。研究表明,薄膜的机械性能和摩擦学性能与薄膜的晶粒尺寸和密度密切相关,而晶粒尺寸和密度又受沉积条件(沉积室中的氧气压力)的影响。
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Effect of the Deposition Conditions on Titanium Oxide Thin Films Properties
This paper presents the fabrication and characterization of titanium oxide thin films deposited by Pulsed Laser Deposition in different experimental conditions. The scope of this work is to investigate the effect of the oxygen pressure in the deposition chamber on the material properties. Thin films characterizations include the mechanical and tribological properties such as the modulus of elasticity, hardness and the adhesion force. The mechanical and tribological properties of the materials are experimentally determined by using the atomic force microscopy technique. The effect of the oxygen pressure on the film thickness is analyzed. As the pressure in the deposition process decreases, the thickness of the thin films increases, respectively. The surfaces roughness increases as the deposition pressure decreases that leads to a decrease of adhesion forces. Hardness and modulus of elasticity increases as the deposition pressure decreases. This study shows that the mechanical and tribological properties of the investigated thin films strongly depend on the grain size and the films density, which are influenced by the deposition conditions (the oxygen pressure in the deposition chamber).
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