一种简单有效的提高p-LDMOSFET热载流子抗扰度的方法

A. Sakai, K. Eikyu, H. Fujii, T. Mori, Y. Akiyama, Y. Yamaguchi
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引用次数: 3

摘要

本文提出了一种简单有效的方法来提高p沟道LDMOSFET的热载流子抗扰度,而不降低击穿电压BV和比导通电阻Rsp等典型参数。通过TCAD仿真,验证了采用热电子冷却(HEC)层的新型st -based p沟道LDMOSFET提高HC抗扰度(即延长p漂长度)的优越性。
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Simple and efficient approach to improve hot carrier immunity of a p-LDMOSFET
This paper proposes a simple and efficient method to improve hot carrier (HC) immunity of p-channel LDMOSFET without degrading typical figure of merits such as breakdown voltage BV and specific on-resistance Rsp. The superiority of a novel STI-based p-channel LDMOSFET with a hot electron cooling (HEC) layer against the conventional method to improve HC immunity (i.e. extending the p-drift length) is confirmed by TCAD simulation.
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