碳纳米管薄膜晶体管器件

J. Wei, C. W. Lee, L. Li
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摘要

在这项研究中,研究人员证明,用重氮试剂对SWNT进行选择性官能化,然后用密度梯度超离心(DGU)去除大部分M种和杂质,制备的SWNT溶液可以实现全半导体器件产率。通过增加网络厚度,器件的有效迁移率可提高到~10 cm2/V·s,同时使通断比保持在5000以上。根据有效迁移率与网络厚度之间的正相关关系,可以通过控制SWNT薄膜的厚度来调节溶液加工SWNT晶体管的迁移率。杂质的去除是实现高通断比器件的必要条件。相反,去除M物种对于获得良好的开关特性至关重要。据推测,使用由小直径管组成的单壁碳纳米管实现全半导体器件产率是由于手性与重氮盐的反应性方面的显着差异。
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Carbon nanotube thin film transistor devices
In this study, it was demonstrated that full semiconductor device yield can be achieved using SWNT solutions prepared by selective functionalization of SWNTs with diazonium reagents and followed by density gradient ultracentrifugation (DGU) to remove most of M species and impurities. By increasing the network thickness, the effective mobility of the devices can be raised to ~10 cm2/V⋅s while keeping the on-off ratio higher than 5000. According to the positive relationship between effective mobility and network thickness, it is possible to tune the mobility of solution processed SWNT transistors by controlling the thickness of SWNT films. The removal of impurities is found to be essential for achieving high on-off ratio devices. Instead, removal of M species is crucial to obtain good on-off characteristics. It is speculated that the achievement of the full semiconductor device yield using the SWNTs consisting of small diameter tubes is due to the significant differences between chiralities in terms of the reactivity with diazonium salts.
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