CMOS集成电路中的ESD延迟效应

W. Greason, Z. Kucerovsky, K. Chum
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引用次数: 1

摘要

对两种类型的市售CMOS集成电路和定制CMOS集成电路进行了测量,以研究ESD(静电放电)引起的潜在故障模式。电流注入试验方法用于两个极性的放电。试验参数包括阈值破坏、恒幅多重应力、阶跃应力和应力硬化效应。统计分析结果表明,静电放电在CMOS集成电路中存在潜在失效。该工作用于进一步扩展潜在故障的电荷注入模型。
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ESD latency effects in CMOS integrated circuits
Measurements were performed on two types of commercially available and custom-made CMOS integrated circuits to investigate the latent mode of failure due to ESD (electrostatic discharge). The current injection test method is used for both polarities of discharge. Test parameters studied include threshold failure, constant amplitude multiple stress, step stress, and the stress hardening effect. Statistical analyses of the results demonstrate the presence of latent failure in CMOS integrated circuits due to ESD. The work is used to further expand a charge injection model for latent failures.<>
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