{"title":"消除电路内反射的植入工艺","authors":"H. Stinehelfer","doi":"10.1109/ARFTG.1987.323869","DOIUrl":null,"url":null,"abstract":"This paper wi1l describe the use of implanting a theoretical reflection inside an experimental measurement to remove a junction capacitance. Time domain analysis will be used to examine what is happening inside the circuit using the frequency domain representation for the \"Implant\". The implant process is performed on a set of measurements to allow more detailed examination of the circuit. The theoretical circuit can be capacitive, inductive or an impedance change at a given location. This technique can allow the measured date to be experimentally changed. The procees is less expensive and faster than making physical tuning changes.","PeriodicalId":287736,"journal":{"name":"29th ARFTG Conference Digest","volume":"49 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1987-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Implantation Process for Removing a Reflection Inside a Circuit\",\"authors\":\"H. Stinehelfer\",\"doi\":\"10.1109/ARFTG.1987.323869\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper wi1l describe the use of implanting a theoretical reflection inside an experimental measurement to remove a junction capacitance. Time domain analysis will be used to examine what is happening inside the circuit using the frequency domain representation for the \\\"Implant\\\". The implant process is performed on a set of measurements to allow more detailed examination of the circuit. The theoretical circuit can be capacitive, inductive or an impedance change at a given location. This technique can allow the measured date to be experimentally changed. The procees is less expensive and faster than making physical tuning changes.\",\"PeriodicalId\":287736,\"journal\":{\"name\":\"29th ARFTG Conference Digest\",\"volume\":\"49 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1987-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"29th ARFTG Conference Digest\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ARFTG.1987.323869\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"29th ARFTG Conference Digest","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ARFTG.1987.323869","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Implantation Process for Removing a Reflection Inside a Circuit
This paper wi1l describe the use of implanting a theoretical reflection inside an experimental measurement to remove a junction capacitance. Time domain analysis will be used to examine what is happening inside the circuit using the frequency domain representation for the "Implant". The implant process is performed on a set of measurements to allow more detailed examination of the circuit. The theoretical circuit can be capacitive, inductive or an impedance change at a given location. This technique can allow the measured date to be experimentally changed. The procees is less expensive and faster than making physical tuning changes.