为权力重塑EDA

J. Rabaey, D. Sylvester, D. Blaauw, K. Bernstein, J. Frenkil, M. Horowitz, W. Nebel, T. Sakurai, A. Yang
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摘要

当今不断上升的功率密度已被广泛认为是CMOS持续扩展的首要挑战。事实上,目前的电力危机让人想起了以前的技术,比如曾经流行的双极和NMOS技术,甚至真空管。对于设计人员和CAD工具开发人员来说,CMOS技术如何应对当前的功耗挑战,将CMOS扩展到低于90纳米的技术是一个重要的问题。随着规模的不断扩大,出现了许多新的挑战,例如泄漏控制、散热和电源分配,这些都需要使用新的设计技术和新的CAD解决方案来解决。本次研讨会汇集了电路设计和CAD工具开发方面的专家,讨论了低功耗设计的现状,并就在功耗受限的设计时代,哪些新的EDA功能是最重要的提供了意见。例如,在90纳米以下的集成电路中,如何以稳健的方式分配功率,以及关键的EDA分析和优化能力是什么?在待机模式和活动模式下,减少泄漏的最佳技术是什么?电压缩放能在多大程度上帮助我们解决动态功耗问题?以功率为中心的设计流程会是什么样子?它将如何改变我们设计ic的方式?该小组的目标是探讨这些问题,并制定EDA社区需要解决的关键问题清单,以使CMOS成功地扩展到90纳米以下时代。
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Reshaping EDA for power
Today's rising power densities have been widely cited as the foremost challenge to continued CMOS scaling. In fact, the current power crisis is reminiscent of the final days previous technologies, such as the once popular bipolar and NMOS technologies and even vacuum tubes. How CMOS technology will respond to the current power challenge to extend CMOS scaling to sub-90nm technology is an important question for designer and CAD tool developers alike. With aggressive scaling a number of new challenges have arisen, such as leakage control, heat removal and power supply distribution, that need to be addressed using new design techniques in conjunction with new CAD solutions.This panel brings together experts in circuit design and CAD tool development to discuss the current status of low-power design and provide opinions on what new EDA capabilities are most important in the power-constrained design era. For instance, how will power be distributed in a robust fashion in sub-90nm ICs, and what are the critical EDA analysis and optimization capabilities? What are the best techniques for leakage reduction, not only in standby modes, but also in the active mode? And how far will voltage scaling take us in attacking the dynamic power consumption issue? What will a power-centric design flow look like and how will it change the way we design ICs? The objective of the panel is to explore these issues and formulate a list of critical issues that need to be addressed by the EDA community to enable successful scaling of CMOS into the sub-90nm era.
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