用霍尔测量法评价Ga-Sn-O薄膜的特性

Kota Imanishi, Asuka Fukawa, T. Matsuda, M. Kimura
{"title":"用霍尔测量法评价Ga-Sn-O薄膜的特性","authors":"Kota Imanishi, Asuka Fukawa, T. Matsuda, M. Kimura","doi":"10.23919/AM-FPD.2018.8437427","DOIUrl":null,"url":null,"abstract":"We investigated the Hall effect of the GTO thin film and the GTO thin film transistor (TFT). The Hall effect mobility in the GTO thin film was 1.21 cm2Ns, which was much smaller than the field effect mobility of the GTO TFT. Next, we made a GTO TFT. The highest field effect mobility of GTO TFT was 8.04 cm2Ns. Moreover, the highest Hall effect mobility of GTO TFT was 7.66 cm2Ns. Hall effect mobility and field effect mobility were almost the same. In addition, the GTO TFT showed higher Hall effect mobility than the GTO thin film. It was thought that the Fermi level rose by applying the gate voltage.","PeriodicalId":221271,"journal":{"name":"2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","volume":"3 2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Characteristic Evaluation of Ga-Sn-O Thin Films by Hall Measurement\",\"authors\":\"Kota Imanishi, Asuka Fukawa, T. Matsuda, M. Kimura\",\"doi\":\"10.23919/AM-FPD.2018.8437427\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We investigated the Hall effect of the GTO thin film and the GTO thin film transistor (TFT). The Hall effect mobility in the GTO thin film was 1.21 cm2Ns, which was much smaller than the field effect mobility of the GTO TFT. Next, we made a GTO TFT. The highest field effect mobility of GTO TFT was 8.04 cm2Ns. Moreover, the highest Hall effect mobility of GTO TFT was 7.66 cm2Ns. Hall effect mobility and field effect mobility were almost the same. In addition, the GTO TFT showed higher Hall effect mobility than the GTO thin film. It was thought that the Fermi level rose by applying the gate voltage.\",\"PeriodicalId\":221271,\"journal\":{\"name\":\"2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)\",\"volume\":\"3 2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.23919/AM-FPD.2018.8437427\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 25th International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.23919/AM-FPD.2018.8437427","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

研究了GTO薄膜和GTO薄膜晶体管(TFT)的霍尔效应。GTO薄膜的霍尔效应迁移率为1.21 cm2Ns,远小于GTO TFT的场效应迁移率。接下来,我们制作了一个GTO TFT。GTO TFT的最高场效应迁移率为8.04 cm2Ns。此外,GTO TFT的霍尔效应迁移率最高为7.66 cm2Ns。霍尔效应迁移率和场效应迁移率基本相同。此外,GTO TFT比GTO薄膜具有更高的霍尔效应迁移率。人们认为施加栅极电压会使费米能级上升。
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Characteristic Evaluation of Ga-Sn-O Thin Films by Hall Measurement
We investigated the Hall effect of the GTO thin film and the GTO thin film transistor (TFT). The Hall effect mobility in the GTO thin film was 1.21 cm2Ns, which was much smaller than the field effect mobility of the GTO TFT. Next, we made a GTO TFT. The highest field effect mobility of GTO TFT was 8.04 cm2Ns. Moreover, the highest Hall effect mobility of GTO TFT was 7.66 cm2Ns. Hall effect mobility and field effect mobility were almost the same. In addition, the GTO TFT showed higher Hall effect mobility than the GTO thin film. It was thought that the Fermi level rose by applying the gate voltage.
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