{"title":"使用石英晶体微天平提供实时过程监控","authors":"H. Tsuchiyama, Steven Lakeman","doi":"10.1109/ISSM51728.2020.9377515","DOIUrl":null,"url":null,"abstract":"The novel sensor for Real-time in situ process monitoring using Quart Crystal Microbalance has been developed to wafer process and deployed in Wafer process. In this document, the deployment result is reviewed and the possibility for the future use is discussed.","PeriodicalId":270309,"journal":{"name":"2020 International Symposium on Semiconductor Manufacturing (ISSM)","volume":"38 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Using Quartz Crystal Microbalance to Provide Real-Time Process Monitoring\",\"authors\":\"H. Tsuchiyama, Steven Lakeman\",\"doi\":\"10.1109/ISSM51728.2020.9377515\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The novel sensor for Real-time in situ process monitoring using Quart Crystal Microbalance has been developed to wafer process and deployed in Wafer process. In this document, the deployment result is reviewed and the possibility for the future use is discussed.\",\"PeriodicalId\":270309,\"journal\":{\"name\":\"2020 International Symposium on Semiconductor Manufacturing (ISSM)\",\"volume\":\"38 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-12-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 International Symposium on Semiconductor Manufacturing (ISSM)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM51728.2020.9377515\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 International Symposium on Semiconductor Manufacturing (ISSM)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM51728.2020.9377515","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Using Quartz Crystal Microbalance to Provide Real-Time Process Monitoring
The novel sensor for Real-time in situ process monitoring using Quart Crystal Microbalance has been developed to wafer process and deployed in Wafer process. In this document, the deployment result is reviewed and the possibility for the future use is discussed.
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