基于HfO2/SiO2薄膜对的离子束溅射涂层中膜界面在近紫外吸收和脉冲激光损伤中的作用

S. Papernov, A. Kozlov, J. Oliver, C. Smith, L. Jensen, D. Ristau, S. Günster, H. Mädebach
{"title":"基于HfO2/SiO2薄膜对的离子束溅射涂层中膜界面在近紫外吸收和脉冲激光损伤中的作用","authors":"S. Papernov, A. Kozlov, J. Oliver, C. Smith, L. Jensen, D. Ristau, S. Günster, H. Mädebach","doi":"10.1117/12.2196654","DOIUrl":null,"url":null,"abstract":"The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser–induced damage was studied for ion-beam–sputtered coatings comprised of HfO2 and SiO2 thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage threshold were measured for a one-wave (355-nm)–thick HfO2 single-layer film and for a film containing seven narrow HfO2 layers separated by SiO2 layers. The seven-layer film was designed to have a total optical thickness of HfO2 layers equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO2 film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thinfilm interfaces, as compared to HfO2 film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO2 film, in agreement with data recently reported for similarly designed electron-beam–deposited coatings. The results are explained through the similarity of interfacial film structure and structure formed during the co-deposition of HfO2 and SiO2 materials.","PeriodicalId":204978,"journal":{"name":"SPIE Laser Damage","volume":"4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2015-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO2/SiO2 thin-film pairs\",\"authors\":\"S. Papernov, A. Kozlov, J. Oliver, C. Smith, L. Jensen, D. Ristau, S. Günster, H. Mädebach\",\"doi\":\"10.1117/12.2196654\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser–induced damage was studied for ion-beam–sputtered coatings comprised of HfO2 and SiO2 thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage threshold were measured for a one-wave (355-nm)–thick HfO2 single-layer film and for a film containing seven narrow HfO2 layers separated by SiO2 layers. The seven-layer film was designed to have a total optical thickness of HfO2 layers equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO2 film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thinfilm interfaces, as compared to HfO2 film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO2 film, in agreement with data recently reported for similarly designed electron-beam–deposited coatings. The results are explained through the similarity of interfacial film structure and structure formed during the co-deposition of HfO2 and SiO2 materials.\",\"PeriodicalId\":204978,\"journal\":{\"name\":\"SPIE Laser Damage\",\"volume\":\"4 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2015-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"SPIE Laser Damage\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2196654\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"SPIE Laser Damage","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2196654","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

研究了由HfO2和SiO2薄膜对组成的离子束溅射涂层中薄膜界面在近紫外吸收和脉冲激光损伤中的作用。为了区分薄膜的大部分和界面区域的贡献,我们测量了一波(355 nm)厚的HfO2单层薄膜和含有7层由SiO2层分隔的狭窄HfO2层的薄膜的吸收和损伤阈值。设计的七层HfO2膜的总光学厚度等于355nm处的一个波,e场峰和平均强度与单层HfO2膜相似。利用激光量热法和光热外差成像测量了两种薄膜的吸收。结果表明,与HfO2薄膜材料相比,薄膜界面对总吸收的贡献较小。通过测量损伤阈值和表征损伤形态,验证了所获得的吸收数据与涂层近紫外、纳秒脉冲激光损伤的相关性。该研究结果表明,与单层HfO2膜相比,七层涂层具有更高的抗损伤性,这与最近报道的类似设计的电子束沉积涂层的数据一致。结果可以通过界面膜结构与HfO2和SiO2材料共沉积时形成的结构的相似性来解释。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO2/SiO2 thin-film pairs
The role of thin-film interfaces in the near-ultraviolet absorption and pulsed-laser–induced damage was studied for ion-beam–sputtered coatings comprised of HfO2 and SiO2 thin-film pairs. To separate contributions from the bulk of the film and from interfacial areas, absorption and damage threshold were measured for a one-wave (355-nm)–thick HfO2 single-layer film and for a film containing seven narrow HfO2 layers separated by SiO2 layers. The seven-layer film was designed to have a total optical thickness of HfO2 layers equal to one wave at 355 nm and an E-field peak and average intensity similar to a single-layer HfO2 film. Absorption in both types of films was measured using laser calorimetry and photothermal heterodyne imaging. The results showed a small contribution to total absorption from thinfilm interfaces, as compared to HfO2 film material. The relevance of obtained absorption data to coating near-ultraviolet, nanosecond-pulse laser damage was verified by measuring the damage threshold and characterizing damage morphology. The results of this study revealed a higher damage resistance in the seven-layer coating as compared to the single-layer HfO2 film, in agreement with data recently reported for similarly designed electron-beam–deposited coatings. The results are explained through the similarity of interfacial film structure and structure formed during the co-deposition of HfO2 and SiO2 materials.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Impact of particle shape on the laser-contaminant interaction induced damage on the protective capping layer of 1ω high reflector mirror coatings Direct comparison of statistical damage frequency method and raster scan procedure Refined metrology of spatio-temporal dynamics of nanosecond laser pulses Characterization of damage precursor density from laser damage probability measurements with non-Gaussian beams Direct absorption measurements in thin rods and optical fibers
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1