{"title":"基于频率的小电容失配测量","authors":"A. Verma, B. Razavi","doi":"10.1109/CICC.2006.320861","DOIUrl":null,"url":null,"abstract":"The mismatch between two capacitors can be measured by alternately switching each into an oscillator and measuring the change in the oscillation frequency. Three-stage differential ring oscillators can provide multiple mismatch data points for capacitances as small as 8 fF. Experimental results obtained from test circuits fabricated in 0.13-mum CMOS technology also reveal lower mismatches for metal sandwich capacitors than for lateral fringe structures","PeriodicalId":269854,"journal":{"name":"IEEE Custom Integrated Circuits Conference 2006","volume":"17 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"24","resultStr":"{\"title\":\"Frequency-Based Measurement of Mismatches Between Small Capacitors\",\"authors\":\"A. Verma, B. Razavi\",\"doi\":\"10.1109/CICC.2006.320861\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The mismatch between two capacitors can be measured by alternately switching each into an oscillator and measuring the change in the oscillation frequency. Three-stage differential ring oscillators can provide multiple mismatch data points for capacitances as small as 8 fF. Experimental results obtained from test circuits fabricated in 0.13-mum CMOS technology also reveal lower mismatches for metal sandwich capacitors than for lateral fringe structures\",\"PeriodicalId\":269854,\"journal\":{\"name\":\"IEEE Custom Integrated Circuits Conference 2006\",\"volume\":\"17 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"24\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"IEEE Custom Integrated Circuits Conference 2006\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CICC.2006.320861\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Custom Integrated Circuits Conference 2006","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICC.2006.320861","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 24
摘要
两个电容器之间的失配可以通过交替地将每个电容器切换到振荡器并测量振荡频率的变化来测量。三级差动环振荡器可以为小至8ff的电容提供多个失配数据点。采用0.13 μ m CMOS技术制作的测试电路的实验结果也表明,金属夹层电容器的失配率低于横向条纹结构
Frequency-Based Measurement of Mismatches Between Small Capacitors
The mismatch between two capacitors can be measured by alternately switching each into an oscillator and measuring the change in the oscillation frequency. Three-stage differential ring oscillators can provide multiple mismatch data points for capacitances as small as 8 fF. Experimental results obtained from test circuits fabricated in 0.13-mum CMOS technology also reveal lower mismatches for metal sandwich capacitors than for lateral fringe structures