利用富勒烯衍生物的碳自旋硬掩膜

SPIE Advanced Lithography Pub Date : 2016-03-25 DOI:10.1117/12.2219212

A. Brown, A. Frommhold, T. Lada, J. Bowen, Z. el Otell, A. Robinson

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引用次数: 5

摘要

我们已经开发了一系列含富勒烯的材料，用于有机硬口罩。报告了材料发展的最新进展以及原始HM100系列的一些外部评估结果。新HM340-383-010配方的初步结果表明，它具有很高的热稳定性(400°C时质量损失约5.5%)和非常高的碳含量(95.3%)，具有很高的蚀刻耐久性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Spin-on-carbon hard masks utilising fullerene derivatives

We have developed a range of fullerene containing materials for use as organic hard masks. Recent advances in material development are reported together with some results from external evaluations of the original HM100 series. Initial results for the new HM340-383-010 formulation show it to have a high thermal stability (~5.5 % mass loss at 400°C) and a very high carbon content (at 95.3%), offering high etch durability.

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SPIE Advanced Lithography

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