{"title":"金属有机化学气相沉积法制备InP-HEMTs InGaAs层的研究三甲基lindium和三乙基lindium的作用","authors":"R. Sakai, M. Uchida, G. Araki","doi":"10.1109/EMICC.2006.282656","DOIUrl":null,"url":null,"abstract":"We studied an InGaAs epitaxial layers growth by metalorganic chemical vapor deposition (MOCVD) for InP-based high electron mobility transistors (HEMTs). The InGaAs channel layer of HEMTs was grown by a new material combination of triethylindium (TEI), triethylgallium (TEG) and arsine (AsH3). An electron mobility of the HEMTs structure sample was 20% higher than the one grown by trimethylindium (TMI), TEG and AsH3. And the DC characteristics of the HEMTs, the drain current and transconductance, were increased compared with the one. It is confirmed that this growth method is quite effective for the improvement of a characteristics of InP-based HEMTs","PeriodicalId":269652,"journal":{"name":"2006 European Microwave Integrated Circuits Conference","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2006-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Studies of InGaAs layers growth by metalorganic chemical vapor deposition for InP-HEMTs; Effects of trimethylindium and triethylindium\",\"authors\":\"R. Sakai, M. Uchida, G. Araki\",\"doi\":\"10.1109/EMICC.2006.282656\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We studied an InGaAs epitaxial layers growth by metalorganic chemical vapor deposition (MOCVD) for InP-based high electron mobility transistors (HEMTs). The InGaAs channel layer of HEMTs was grown by a new material combination of triethylindium (TEI), triethylgallium (TEG) and arsine (AsH3). An electron mobility of the HEMTs structure sample was 20% higher than the one grown by trimethylindium (TMI), TEG and AsH3. And the DC characteristics of the HEMTs, the drain current and transconductance, were increased compared with the one. It is confirmed that this growth method is quite effective for the improvement of a characteristics of InP-based HEMTs\",\"PeriodicalId\":269652,\"journal\":{\"name\":\"2006 European Microwave Integrated Circuits Conference\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 European Microwave Integrated Circuits Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EMICC.2006.282656\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 European Microwave Integrated Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EMICC.2006.282656","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Studies of InGaAs layers growth by metalorganic chemical vapor deposition for InP-HEMTs; Effects of trimethylindium and triethylindium
We studied an InGaAs epitaxial layers growth by metalorganic chemical vapor deposition (MOCVD) for InP-based high electron mobility transistors (HEMTs). The InGaAs channel layer of HEMTs was grown by a new material combination of triethylindium (TEI), triethylgallium (TEG) and arsine (AsH3). An electron mobility of the HEMTs structure sample was 20% higher than the one grown by trimethylindium (TMI), TEG and AsH3. And the DC characteristics of the HEMTs, the drain current and transconductance, were increased compared with the one. It is confirmed that this growth method is quite effective for the improvement of a characteristics of InP-based HEMTs
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