用于高性能MEMS传感器和执行器的Ni80Fe20 v形磁芯

U. Abidin, B. Majlis, J. Yunas
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引用次数: 2

摘要

开发集成铁磁材料结构作为磁芯是高性能MEMS传感器和执行器的关键。磁芯结构能够改善磁通连接并使磁通密度在磁装置中集中,从而产生高磁场。以往的研究将不同结构的铁磁材料嵌入到硅衬底中作为MEMS磁芯。在75℃条件下,采用30%氢氧化钾(KOH)的各向异性湿法刻蚀制备v型磁芯,制备v型硅腔结构。采用直流电镀技术对坡莫合金(Ni80Fe20)进行填充。本研究采用10 mA/cm2的低电流密度电沉积Ni80Fe20磁膜。在电解液组合物中加入糖精,由于电沉积膜的内应力降低,产生了明亮且无裂纹的结构。这种效应对于具有良好磁性能的磁芯是必不可少的。镀镍Ni80Fe20在v型空腔尖端的锋利边缘处有较厚的组织。产生这种效应的原因是在这些边缘处产生了高电流通量密度。在此基础上,成功地证明了v型Ni80Fe20磁芯的制备。该磁芯有望为片上MEMS器件应用提供优越的磁性能。
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Ni80Fe20 V-shaped magnetic core for high performance MEMS sensors and actuators
Development of integrated ferromagnetic materials structure as magnetic core is crucial for high performance MEMS sensors and actuators. A core structure is able to improve the magnetic flux linkage and concentrate the magnetic flux density in the magnetic device resulting high magnetic field generation. Previous research has utilized various ferromagnetic materials of different structures embedded into the silicon substrate as MEMS magnetic core. This paper presents fabrication of V-shaped magnetic core by anisotropic wet etching of 30 percent potassium hydroxide (KOH) at 75 °C to produce V-shaped silicon cavity structure. Filling process of Permalloy (Ni80Fe20) into the cavity is done by DC electroplating technique. Low current density of 10 mA/cm2 is used to electrodeposit Ni80Fe20 magnetic film in this study. Saccharin addition into the electrolyte composition produced a bright and crack free structure as internal stress in the electrodeposited film is reduced. This effect is essential to have good magnetic properties of the magnetic core. Thicker structure of electroplated Ni80Fe20 is observed at the sharp edges of the V-shaped cavity tip. The reason of this effect to happen is because high current flux density occurrence at those edges. From this work, fabrication of V-shaped Ni80Fe20 magnetic core has been successfully demonstrated. This magnetic core is expected to give superior magnetic performance for on chip MEMS device applications.
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