{"title":"LSI光刻:现状与未来趋势","authors":"S. Yoshida","doi":"10.1364/sxray.1992.ma1","DOIUrl":null,"url":null,"abstract":"The current photolithographic methods employ shorter wavelength light for finer resolving power as exemplified in the rapid transition from g-line to i-line steppers now taking place. The application of new technological attempts like phase-shift or partial illumination methods will further pursuit this trend. Then comes the deep-UV lithography with Eximer laser used as the light source, with which it seems possible to attain 0.2 5µm resolution for production LSIs.","PeriodicalId":409291,"journal":{"name":"Soft-X-Ray Projection Lithography","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"LSI Lithography: Present Status and Future Trends\",\"authors\":\"S. Yoshida\",\"doi\":\"10.1364/sxray.1992.ma1\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The current photolithographic methods employ shorter wavelength light for finer resolving power as exemplified in the rapid transition from g-line to i-line steppers now taking place. The application of new technological attempts like phase-shift or partial illumination methods will further pursuit this trend. Then comes the deep-UV lithography with Eximer laser used as the light source, with which it seems possible to attain 0.2 5µm resolution for production LSIs.\",\"PeriodicalId\":409291,\"journal\":{\"name\":\"Soft-X-Ray Projection Lithography\",\"volume\":\"50 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Soft-X-Ray Projection Lithography\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/sxray.1992.ma1\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Soft-X-Ray Projection Lithography","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/sxray.1992.ma1","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The current photolithographic methods employ shorter wavelength light for finer resolving power as exemplified in the rapid transition from g-line to i-line steppers now taking place. The application of new technological attempts like phase-shift or partial illumination methods will further pursuit this trend. Then comes the deep-UV lithography with Eximer laser used as the light source, with which it seems possible to attain 0.2 5µm resolution for production LSIs.
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