用等离子体辅助化学蚀刻对光学和其他表面进行快速、非接触、无损伤的成型

C. Zarowin, L. D. Bollinger
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引用次数: 0

摘要

实验结果表明,等离子体辅助化学蚀刻(PACE)可以在没有机械接触的情况下快速、可控地绘制(形状)和光滑光学表面。例如,这种工艺大大减少了机械工艺对石英光学元件设计的限制,例如对衬底刚性的要求和所得到的表面的球度限制。对该过程的相关化学和物理进行了总结,为了解其特点提供了基础。一种适用于PACE的表面演化理论被用来展示PACE预测的表面地形范围。除其他外,各向同性和各向异性蚀刻工艺本质上都具有小于0.1 mm的微光滑特征,并且去除平滑而沉积粗糙。
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Rapid, noncontact, damage free shaping of optical and other surfaces with plasma assisted chemical etching
Experimental results are presented demonstrating that plasma-assisted chemical etching (PACE) can rapidly and controllably figure (shape) and smooth optical surfaces without mechanical contact. This process, for example, significantly reduces the constraints on the design of quartz optical elements imposed by mechanical processes, such as the requirement of substrate rigidity and the limitation of sphericity of the resulting surface. The pertinent chemistry and physics of this process is summarized to provide a basis for understanding its characteristics. A theory of surface evolution applicable to PACE is used to show the range of surface topographies predicted for PACE. It is shown, among other things, that both isotropic and anisotropic etch processes intrinsically microsmooth features smaller than 0.1 mm, and that removal smooths while deposition roughens.<>
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