数据密集型应用的未来互连材料和系统集成策略

P. Apte, T. Salmon, Richard Rice, M. Gerber, R. Beica, Jeff Calvert, D. Hemker, Y. Dordi, M. Ranjan, S. Ramalingam, Jaspreet Gandhi, A. Kaviani, S. Mitra, P. Wong, Vincent Lee Stanford, M.R. El-Sabry
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引用次数: 1

摘要

今天的微电子行业面临着多重变化:技术复杂性的增加,物联网(IoT)和人工智能(AI)等新兴数据密集型市场驱动因素,以及对系统级集成和优化的日益关注。这些变化要求行业建立跨越传统竖井的创新协作模式。SEMI已经建立了一个协作平台,专门通过对未来技术(5-8年后)进行早期和全面的评估来应对这一挑战。第一个项目侧重于互连材料和集成策略,这对大多数计算系统至关重要。这里研究的具体因素包括导线宽度缩小时电阻率的增加,提出的解决方案的供应链问题,以及对简单电路系统延迟的影响。此外,我们还比较了二维(2D)系统与基于中间体的系统(2.5D),以量化后者对各种应用的能量延迟积的影响。
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Future Interconnect Materials and System Integration Strategies for Data-Intensive Applications
The microelectronics industry today faces multiple inflections: increasing technology complexity, emerging dataintensive market drivers like the Internet of Things (IoT) and Artificial Intelligence (AI), and an increasing focus on systemlevel integration & optimization. These inflections challenge the industry to build innovative collaboration models that cut across traditional silos. SEMI has built a collaborative platform specifically to address this challenge by providing early and comprehensive assessment of future technologies (5-8 years out). The first project focused on interconnect materials and integration strategies, which are critical to most computing systems. Specific elements studied here include the increase in resistivity with narrowing wire-widths, supply-chain issues with proposed solutions, and the impact on latency for simple circuit systems. In addition, we also compared a two-dimensional (2D) system with an interposer-based system (2.5D) to quantify the impact of the latter on the energy-delay product for various applications.
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