超高Dv/dt重复平方电压下功率模块的局部放电行为

Haoyang You, Zhuo Wei, Mohammed Aldawsari, Boxue Hu, Risha Na, Jin Wang
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引用次数: 1

摘要

随着新一代半导体开关速度的提高,功率模块中更容易发生局部放电(PD)。然而,在非常快的dv/dt(大于$50 \ mathm {kV}/\mu\ mathm {s}$)重复方波电压下,PD的行为研究很少。为了解决这一问题,研究了在快速dv/dt ($130 \ mathm {kV}/\mu\ mathm {s}$)重复方电压下,具有不同沟槽距离和倒角半径的直接结合铜(DBC)样品的局部放电行为。结果表明:对于不同沟槽距离,当倒角半径大于0.5 mm时,局部放电起始电压(PDIV)随沟槽距离的增加呈线性增加,而当倒角半径小于0.5 mm时,PDIV呈驼峰曲线;当沟槽距离为0.5 mm时,视电荷为23nc,色散较大。对于不同的倒角半径,PDIV从零(直角)到0.7 mm呈半径增加的u型曲线。当倒角半径为零时,表观电荷约为325 pC,色散较大。本文给出了详细的实验结果和讨论。
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Partial Discharge Behaviors in Power Module under Very High Dv/dt Repetitive Square Voltages
Partial discharge (PD) is more likely to happen in the power module due to the increasing switching speed of new generation semiconductors. However, little research has been done to study the PD behaviors under very fast dv/dt (above $50 \mathrm{kV}/\mu\mathrm{s}$) repetitive square-wave voltages. To address this problem, PD behaviors of designed direct bonded copper (DBC) samples with different trench distances and chamfer radiuses under fast dv/dt ($130 \mathrm{kV}/\mu\mathrm{s}$) repetitive square voltages are studied. The results show that, for different trench distances, the partial discharge inception voltage (PDIV) increases linearly with increasing trench distances when the chamfer radius is larger than 0.5 mm, while PDIV shows a hump curve when the chamfer radius is less than 0.5 mm. The apparent charge becomes 23 nC with a large dispersion when the trench distance is 0.5 mm. For different chamfer radiuses, PDIV presents a U-shape shape curve with increasing radiuses from the zero (right angle) to 0.7 mm. The apparent charge is about 325 pC with a large dispersion when the chamfer radius is zero. The detailed experiment results and discussions are presented in this paper.
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