rf溅射CoSb3薄膜的热电性能

H. Anno, K. Matsubara, Y. Notohara, T. Sakakibara, K. Kishimoto, T. Koyanagi
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引用次数: 6

摘要

研究了具有立方方角榴石结构的CoSb/ sub3 /的薄膜生长和电子输运性质。利用磁控射频溅射技术,在Si(100)和石英衬底上成功地生长出了skutudite CoSb/ sub3 /薄膜。当溅射气体压力降低时,沿[310]平面发生择优取向生长。通过对溅射膜进行低温退火,还可以得到具有角钴矿结构的多晶薄膜。薄膜的电导率随薄膜生长条件的变化而变化。用x射线光电子能谱研究了薄膜的电子结构。观察到的价带结构与最近的能带计算结果吻合得很好。结果表明,CoSb的价带结构由Co d和Sb p态的杂化带和Co d局域态衍生出的峰结构组成。
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Thermoelectric properties of rf-sputtered CoSb3 films
Film growth and electronic transport properties of CoSb/sub 3/ with the cubic skutterudite structure were studied. The skutterudite CoSb/sub 3/ films were successfully grown on Si(100) and quartz substrates by using a magnetron rf-sputtering. A preferential orientation growth along [310] plane occurs when the pressure of sputtering gas decreases. Polycrystalline films with the skutterudite structure are also obtained by annealing sputtered films at low temperature. Electrical conductivity of the films changes with the film growth conditions. Electronic structure of the films was investigated by X-ray photoelectron spectroscopy. Observed valence band structure agrees well with a recent band calculation. It is revealed that the valence band structure of CoSb, consists of the hybridized bands between Co d and Sb p states and a peak structure derived from localized Co d state.
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