用于超细间距芯片对芯片互连的三元无铅SnAgCu微凸点

Tsung-Fu Tsai, Jing-Yao Chang, Chien-Wei Chien, J. Juang, Li-Cheng Shen
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引用次数: 1

摘要

浸没式碰焊,一种无掩膜低成本的工艺,为超细间距芯片互连带来了可行性;然而,如何制作均匀的微凹凸仍然是一个很大的挑战。在凹凸金属化(UBM)条件下,在化学镀镍表面形成了具有极薄Sn-3.0Ag-0.5Cu (SAC305)焊料层的均匀微凸点。我们使用的测试芯片有6,507个SAC305焊料微凸点,间距为30微米。两个测试芯片相互粘接,并确定最佳的粘接条件,以获得足够的粘接质量。在150℃下时效168 h后,观察了粘结试样的界面微观结构。结果表明,钎料/UBM界面处的快速相生长将对焊点可靠性产生很大影响。
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Ternary lead-free SnAgCu micro-bumps for ultra-fine pitch chip-to-chip interconnection
Immersion solder bumping, a mask-less and low cost processing, brings feasibility to the ultra-fine pitch chip-to- chip interconnection; however, how to make the uniform micro-bump is still a great challenge. In this paper, the uniform micro-bumps with very thin Sn-3.0Ag-0.5Cu (SAC305) solder layer on electroless nickel under bump metallization (UBM) are achieved. The test chips we used have 6,507 SAC305 solder micro-bumps with a pitch of 30 um. Two test chips are bonded to each other, and the optimum bonding conditions for a sufficient bonding quality are determined. The interfacial microstructure of the bonded samples before and after aging at 150degC for 168 hours is also investigated. The present results shows that the rapid phase growth at the solder/UBM interface would have a great impact on solder joint reliability.
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