纳米级技术的可变性弹性低功耗7T-SRAM设计

Touqeer Azam, B. Cheng, D. Cumming
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引用次数: 29

摘要

纳米级技术的高可变性很容易破坏精心设计的标准6T-SRAM单元的稳定性,导致读/写操作期间的访问失败。我们提出了一种7T-SRAM单元,以提高大变化下的读写稳定性。提出的设计使用低开销的读/写辅助电路来提高噪声抗扰性。使用一个额外的晶体管和一个浮动地允许读取干扰自由操作。而写辅助电路在写操作期间提供浮动地,通过关闭交叉耦合逆变器对的接地路径的电源电压来削弱单元存储。这允许高速/低功耗写入操作。蒙特卡罗模拟表明,当受到随机掺杂波动,线边缘粗糙度和多粒度变化的影响时,与传统的6T-SRAM设计相比,读取稳定性提高了200%,写入稳定性提高了124%。采用标准6T和7T SRAM单元设计的45nm 64×32位SRAM阵列的HSPICE模拟表明,该设计的写入速度/写入功率提高了31%,读取功率降低了60%,总平均功耗降低了44%。
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Variability resilient low-power 7T-SRAM design for nano-scaled technologies
High variability in nano-scaled technologies can easily disturb the stability of a carefully designed standard 6T-SRAM cell, causing access failures during a read/write operation. We propose a 7T-SRAM cell to increase the read/write stability under large variations. The proposed design uses a low overhead read/write assist circuitry to increase the noise immunity. Use of an additional transistor and a floating ground allows read disturb free operation. While the write assist circuitry provides a floating ground during a write operation that weakens cell storage by turning off the supply voltage to ground path of the cross-coupled inverter pair. This allows a high speed/low power write operation. Monte Carlo simulations indicate a 200% increase in the read stability and a boost of 124% in write stability compared to a conventional 6T-SRAM design, when subjected to random dopant fluctuations, line edge roughness, and poly-granularity variations. HSPICE simulations of a 45nm 64×32 bit SRAM array designed using standard 6T and proposed 7T SRAM cells indicate a 31% improvement in write speed/write power, read power decreases by 60%, and a 44% reduction in the total average power consumption is achieved with the proposed design.
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