失控电子预电离放电中的红外、紫外和紫外激光作用

A. N. Panchenko, N. A. Panchenko, D. Sorokin, M. Lomaev
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引用次数: 0

摘要

研究了激光在失控电子预电离放电中的作用。在红外到紫外的宽光谱范围内获得了高效的激光发射。结果表明,在REP - DD中,非链化学激光对HF (DF)分子和N2激光在337.1 nm处达到了极限效率,并发现了在REP - DD连续振荡中出现2个或3个峰的N2激光工作模式。首次证明了KrF*和XeF*准分子的激光参数接近传统横向放电泵浦激光器的激光参数。首次获得了在REP DD泵浦下F2*和稀有气体氟化物在157 nm处的激光作用。在REP DD激励下,VUV F2*激光器的效率和脉冲持续时间与预电离横向放电的效率和脉冲持续时间相当。在二元和三元Ar-Xe-(He)和Ar-Kr-(He)混合物中测量了REP DD在接近147 nm波长处的紫外辐射。考虑了在稀有气体混合物中产生紫外激光的可能性。
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Laser action in the IR, UV and VUV in runaway electron preionized discharges
Laser action in run-away electron preionized discharge (REP DD) was studied. Efficient laser emission was obtained in wide spectral range from IR to VUV. It was shown that ultimate efficiency of non-chain chemical lasers on HF (DF) molecules and N2 laser at 337.1 nm can be achieved in REP DD. New mode of N2 laser operation with 2 or 3 peaks in successive REP DD current oscillations was found. Efficient lasing on KrF* and XeF* excimer molecules with parameter close to laser parameters of lasers pumped by conventional transverse discharge were demonstrated for the first time. Laser action on F2* at 157 nm and rare gas fluorides under REP DD pumping was obtained for the first time, as well. The efficiency and pulse duration of VUV F2* laser under REP DD excitation are comparable with those obtained in transverse discharges with preionization. VUV emission of REP DD in binary and ternary Ar-Xe-(He) and Ar-Kr-(He) mixtures at wavelength close to 147 nm was measured. Possibility of VUV lasing in mixtures of rare gases is considered.
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