B. Green, H. Henry, J. Selbee, F. Clayton, K. Moore, M. CdeBaca, J. Abdou, C.L. Liu, O. Hartin, D. Hill, M. Miller, C. Weitzel
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引用次数: 4
摘要
本报告介绍了飞思卡尔48 V GaN HFET技术的直流、脉冲I-V、小信号和大信号特性。在48V漏极偏置下,12.6 mm的大信号性能表征显示,输出功率为89 W,相关功率密度为7.1 W/mm,线性增益为17.5 dB,功率附加效率(PAE)为62%。通道温度过漏偏置分析表明,饱和RF工作时,28v和48v的最大通道温度分别为107°C和245°C。在16.2 mm器件上随时间的射频漂移数据显示,在1000小时内,射频漂移小于0.2 dB。的测试。与飞思卡尔先前报道的GaN HFET技术相比,这一射频性能水平有了显著的4 dB增益和2 W/mm功率密度的提高。
Characterization and thermal analysis of a 48 V GaN HFET device technology for wireless infrastructure applications
This report presents the DC, pulsed I–V, small signal, and large signal characteristics of Freescale’s 48 V GaN HFET technology. Characterization of large signal performance for a 12.6 mm at 48V drain bias shows 89 W output power with an associated power density of 7.1 W/mm, linear gain of 17.5 dB, and a power-added efficiency (PAE) of 62%. Analysis of channel temperature over drain bias shows that the maximum channel temperatures at 28 V and 48 V are 107 °C and 245 °C, respectively during saturated RF operation. Data for RF drift over time on a 16.2 mm device show less than 0.2 dB of RF drift for ≫1000 hrs. of testing. This level of RF performance represents a significant ≫4 dB gain and ≫2 W/mm power density improvement over Freescale’s previously reported GaN HFET technology.