用于可扩展的0.1 /spl μ m以下存储器的单电子关断晶体管

T. Osabe, T. Ishii, T. Mine, F. Murai, K. Yano
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引用次数: 7

摘要

所开发的单电子关断(SESO)晶体管的漏电流范围为10/sup -19/ a(每100 ms小于一个电子;它开创了4gb或更大的后DRAM存储器的时代。在超薄(2nm)多晶硅薄膜中,由于相邻阱的数量有限和库仑封锁效应,电子在阱之间的跳跃被显著抑制。使用SESO晶体管的SESO存储器增益单元,即使没有存储器电容,也具有超过3,000秒的保留时间。
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A single-electron shut-off transistor for a scalable sub-0.1 /spl mu/m memory
The developed single-electron shut-off (SESO) transistor has a leakage current in the range of 10/sup -19/ A (less than one electron per 100 ms; typical DRAM refresh cycle) or better, and it ushers in an era of opportunities for 4-Gb-or-larger post-DRAM memories. In its ultra-thin (2 nm) polycrystalline silicon film, electron hopping between traps is dramatically suppressed because of its limited number of neighboring traps and the Coulomb blockade effect. A SESO memory gain cell using the SESO transistor, has an over 3,000 second retention time even without a memory capacitor.
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