双栅全能(DGAA) mosfet漏极电流建模

Arun Kumar, S. Bhushan, P. Tiwari
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引用次数: 11

摘要

本文提出了双栅全功率(DGAA) mosfet漏极电流的解析模型。所有多栅(MG) mosfet的一个共同特征是,亚阈值区域的通道电荷与通道横截面积成正比;而高于阈值的反转电荷位于Si/SiO2界面附近,且与通道体的总门控周长成正比。这种独特的特性引入了等效电荷的概念,并被广泛用于模拟任意非经典MOSFET结构的漏极电流。作者扩展了上述的准方法来模拟DGAA MOSFET的漏极电流。DGAA MOSFET的总门控周长由两个半径不同的GAA MOSFET的门控周长映射,用于计算阈值以上表面反转电荷。将两个GAA MOSFET的电流相加得到DGAA MOSFET的电流。对比分析了不同物理参数下器件的I-V特性和跨导特性,并与Cogenda Int公司Visual-TCAD的数值模拟结果进行了比较。
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Drain current modelling of double gate-all-around (DGAA) MOSFETs
Here, an analytical modelling of drain current is presented for double gate-all-around (DGAA) MOSFETs. A common feature in all the multi-gate (MG) MOSFETs is that the channel charge in the sub-threshold regime is proportional to the channel cross-sectional area; whereas, the inversion charges above threshold locate near the Si/SiO2 interfaces and are proportional to the total gated perimeter of the channel body. This distinctive feature introduces the notion of equivalent charge and has been widely used to model the drain current of any arbitrary non-classical MOSFET architecture. The authors have extended the aforementioned quasi-approach to model the drain current of DGAA MOSFET. The total gated perimeter of DGAA MOSFET is mapped by the gated perimeter of two GAA MOSFETs with different radii for the calculation of surface inversion charges above threshold. The currents obtained from two GAA MOSFETs are summed up to obtain the current of DGAA MOSFET. I–V characteristics and transconductance of the device for various physical parameters are compared and analysed with the numerical simulation results obtained from Visual-TCAD of Cogenda Int.
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