{"title":"氧化钽基电阻开关器件中导电丝结构和离子迁移行为的密度泛函研究综述","authors":"Satoshi Watanabe, B. Xiao","doi":"10.1109/INEC.2014.7460431","DOIUrl":null,"url":null,"abstract":"We have performed density functional calculations toward the microscopic understanding of tantalum oxide based resistive switching devices. In this review, we discuss the structures and electric properties of the conductive filaments in Cu/Ta2O5/Pt and Pt/TaOx/Pt resistive switching devices. We also discuss the migration behaviors of Cu and O ions in these devices.","PeriodicalId":188668,"journal":{"name":"2014 IEEE International Nanoelectronics Conference (INEC)","volume":"197 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-07-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Review of our density functional study on the structures of conductive filaments and ion migration behaviors in tantalum oxide based resistive switching devices\",\"authors\":\"Satoshi Watanabe, B. Xiao\",\"doi\":\"10.1109/INEC.2014.7460431\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We have performed density functional calculations toward the microscopic understanding of tantalum oxide based resistive switching devices. In this review, we discuss the structures and electric properties of the conductive filaments in Cu/Ta2O5/Pt and Pt/TaOx/Pt resistive switching devices. We also discuss the migration behaviors of Cu and O ions in these devices.\",\"PeriodicalId\":188668,\"journal\":{\"name\":\"2014 IEEE International Nanoelectronics Conference (INEC)\",\"volume\":\"197 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-07-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2014 IEEE International Nanoelectronics Conference (INEC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/INEC.2014.7460431\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2014 IEEE International Nanoelectronics Conference (INEC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/INEC.2014.7460431","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Review of our density functional study on the structures of conductive filaments and ion migration behaviors in tantalum oxide based resistive switching devices
We have performed density functional calculations toward the microscopic understanding of tantalum oxide based resistive switching devices. In this review, we discuss the structures and electric properties of the conductive filaments in Cu/Ta2O5/Pt and Pt/TaOx/Pt resistive switching devices. We also discuss the migration behaviors of Cu and O ions in these devices.