基于CMOS数字噪声仿真器的射频集成电路衬底噪声耦合测量与仿真

N. Azuma, S. Shimazaki, N. Miura, M. Nagata, T. Kitamura, Shin-ichiro Takahashi, M. Murakami, K. Hori, A. Nakamura, K. Tsukamoto, M. Iwanami, E. Hankui, S. Muroga, Y. Endo, S. Tanaka, M. Yamaguchi
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引用次数: 14

摘要

通过全芯片级仿真和片上测量,研究了LTE无线通信射频接收器前端电路中的衬底噪声耦合,并采用65nm CMOS技术进行了验证。完整的全芯片级基片噪声耦合仿真流程采用解耦建模方法,将噪声源电路的统一封装芯片模型绘制的基片噪声波形作为噪声敏感电路给予射频链的混合级仿真。模拟了衬底噪声在芯片中的分布及随距离的衰减,并与实测结果进行了比较。CMOS噪声模拟器的工作频率为124.8 MHz, 17次谐波处的衬底噪声的干扰在2.1 GHz的通信带宽内产生杂散音。
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Measurements and simulation of substrate noise coupling in RF ICs with CMOS digital noise emulator
Substrate noise coupling in RF receiver front end circuitry for LTE wireless communication was examined by full-chip level simulation and on-chip measurements, with a demonstrator built in a 65 nm CMOS technology. A complete simulation flow of full-chip level substrate noise coupling uses a decoupled modeling approach, where substrate noise waveforms drawn with a unified package-chip model of noise source circuits are given to mixed-level simulation of RF chains as noise sensitive circuits. The distribution of substrate noise in a chip and the attenuation with distance are simulated and compare with the measurements. The interference of substrate noise at the 17th harmonics of 124.8 MHz - the operating frequency of the CMOS noise emulator creates spurious tones in the communication bandwidth at 2.1 GHz.
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