PECVD沉积氮掺杂DLC薄膜的场发射特性

K. Park, J. Moon, Jae Gak Kim, S. Chung, M. Oh, Jin Jang
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引用次数: 2

摘要

研究了N掺杂对PECVD法制备类金刚石(DLC)薄膜电导率和电子发射性能的影响。通过n型掺杂,DLC的电导率可以发生很大的变化。电导率前因子与电导率活化能之间的关系满足Meyer-Neldel关系:/spl sigma//sub 0/=/spl sigma//sub 00/exp(AE/sub a/),其中a =19 eV/sup -1/和/spl sigma//sub 00/=9/spl × /10/sup -8/ S/cm。轻氮掺杂DLC薄膜的发射电流要小得多,而重氮掺杂DLC薄膜的发射电流要比未掺杂DLC高得多。
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Field emission of nitrogen doped DLC films deposited by PECVD
The N doping effect on the electrical conductivity and electron emission property for diamond like carbon (DLC) films deposited by PECVD has been studied. The electrical conductivity can be widely varied by n-type doping of the DLC. The relationship between the prefactor of conductivity and the conductivity activation energy satisfy the Meyer-Neldel relation: /spl sigma//sub 0/=/spl sigma//sub 00/exp(AE/sub a/) with A=19 eV/sup -1/ and /spl sigma//sub 00/=9/spl times/10/sup -8/ S/cm. The emission currents for heavily N doped DLC films are much higher than undoped DLC even though lightly N doped films show much smaller currents.
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