MOCVD生长立方氮化镓薄膜的结构研究

H. Vilchis, V. M. Sanchez-R, A. Escobosa
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引用次数: 0

摘要

本文报道了在GaAs氮化制备的模板上制备立方氮化镓外延膜的特性。在未掺杂或掺杂mg的薄膜中分别获得N型或p型材料。Mg化合物的使用导致薄膜中出现六方相的倾向,但可以通过调整实验参数来避免这种影响。结果表明,该材料可适用于光电器件的实现。
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Structural studies of cubic GaN films grown by MOCVD
In this work the characterization of cubic GaN epitaxial films on templates obtained by nitridation of GaAs is reported. N- or p-type materials were obtained in Undoped or Mg-doped films respectively. The use of Mg compounds results in a tendency to incorporate the hexagonal phase in the films, but this effect can be avoided adjusting the experimental parameters. The results show that the materials can be suitable to the realization of optoelectronic devices.
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