硅量子点谷裂中的界面和电磁效应

J. Lima, G. Burkard
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引用次数: 0

摘要

硅自旋量子比特的性能和可扩展性直接取决于导带谷分裂的大小。本文研究了电磁场和界面宽度对Si/SiGe异质结构中量子点谷分裂的影响。我们在有效质量理论的基础上,提出了一种新的三维理论模型来计算这种异质结构中的谷分裂,该模型考虑了界面处的浓度波动和侧向约束。利用该模型,我们预测电场是谷裂工程的一个重要参数,因为它可以改变某些界面宽度下小谷裂的概率分布。我们还获得了异质结构中界面的临界柔软度,在此之上,自旋量子比特的最佳选择是考虑尽可能宽的界面。
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Interface and electromagnetic effects in the valley splitting of Si quantum dots
The performance and scalability of silicon spin qubits depend directly on the value of the conduction band valley splitting. In this work, we investigate the influence of electromagnetic fields and the interface width on the valley splitting of a quantum dot in a Si/SiGe heterostructure. We propose a new three-dimensional theoretical model within the effective mass theory for the calculation of the valley splitting in such heterostructures that takes into account the concentration fluctuation at the interfaces and the lateral confinement. With this model, we predict that the electric field is an important parameter for valley splitting engineering, since it can shift the probability distribution away from small valley splittings for some interface widths. We also obtain a critical softness of the interfaces in the heterostructure, above which the best option for spin qubits is to consider an interface as wide as possible.
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