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Nitrogen-vacancy centers in diamond: discovery of additional electronic states 金刚石中的氮空位中心:额外电子态的发现
Pub Date : 2024-07-10 DOI: 10.1088/2633-4356/ad61b3
Minh-Tuan Luu, Ali Tayefeh Younesi, Ronald Ulbricht
Nitrogen-vacancy (NV) defect centers in diamond are key to applications in quantum sensing and quantum computing. They create localized electronic states in the diamond lattice with distinct population relaxation pathways following photoexcitation that ultimately enable its unique properties. The defect is known to exist in two charge states: neutral and negative, with respectively one and two known optically-active electronic transitions. Here, we report on the observation of a large number of hitherto undiscovered excited electronic states in both charge states as evidenced by distinct optical transitions in the infrared to ultraviolet part of the spectrum. These transitions are observed by monitoring the electronic relaxation of NV centers after photoexcitation using transient absorption spectroscopy, directly probing transient phenomena occurring on timescales from femtoseconds to microseconds. We also for the first time probed the electron transfer dynamics from the 3E state of NV− to nearby single-substitutional nitrogen defects hat leads to the well-known effect of NV photoluminescence quenching.
金刚石中的氮空位(NV)缺陷中心是量子传感和量子计算应用的关键。它们在金刚石晶格中形成局部电子态,在光激发后具有独特的群体弛豫途径,最终使金刚石具有独特的特性。已知这种缺陷存在两种电荷状态:中性和负性,分别有一个和两个已知的光学活性电子跃迁。在此,我们报告了在这两种电荷态中观察到的大量迄今未被发现的激发电子态,它们在光谱的红外至紫外部分有明显的光学转变。这些跃迁是通过使用瞬态吸收光谱监测 NV 中心在光激发后的电子弛豫来观察的,直接探测了从飞秒到微秒级的瞬态现象。我们还首次探测了电子从 NV- 的 3E 态转移到附近的单体制氮缺陷的动态,这导致了众所周知的 NV 光致发光淬灭效应。
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引用次数: 0
Fabrication of tips for scanning probe magnetometry by diamond growth 用金刚石生长法制造扫描探针磁强计的针尖
Pub Date : 2024-06-14 DOI: 10.1088/2633-4356/ad589d
Arne Götze, Xavier Vidal, Nicola Lang, Christian Giese, Patricia Quellmalz, Jan Jeske, Peter Knittel
The use of quantum sensors is promising detailed insights into physical phenomena such as magnetism or superconductivity. One example of such quantum sensors is a microscopic diamond tip containing nitrogen vacancy (NV) centers, which is capable of producing correlated measurements of vectorial magnetic fields and the sample topography on the nanoscale. In this study, we present a chemical vapor deposition (CVD) process to produce diamond tips with NV centers by overgrowing microstructured diamond substrates. The resulting diamond tips exhibit a radius of curvature of approximately 10 nm, suitable for use as a probe in an atomic force microscope (AFM). The magnetic sensitivity of the CVD-grown diamond tips is characterized with pulsed measurements of the optically detected magnetic resonance (ODMR), which yield a minimum magnetic sensitivity of 60 µT/√Hz. The growth of the diamond microstructures is observed to differ from the commonly used geometric model predicting CVD growth of bulk diamond crystals. We identify an empirical model for the growth behavior of the microstructures by taking into account processes described in the step flow growth model for crystals. Additionally, we demonstrate the applicability of the developed CVD growth process to membrane substrates required for the preparation of magnetometry-capable diamond tips.
量子传感器的使用有望详细揭示磁性或超导等物理现象。这种量子传感器的一个例子是含有氮空位(NV)中心的微型金刚石尖端,它能够在纳米尺度上对矢量磁场和样品形貌进行相关测量。在这项研究中,我们介绍了一种化学气相沉积(CVD)工艺,通过在微结构金刚石基底上过度生长,生产出含有氮空位中心的金刚石尖端。生成的金刚石尖端曲率半径约为 10 纳米,适合用作原子力显微镜 (AFM) 的探针。CVD 生长的金刚石尖端的磁灵敏度是通过光学检测磁共振 (ODMR) 的脉冲测量得出的,其最小磁灵敏度为 60 µT/√Hz。据观察,金刚石微结构的生长与常用的预测块状金刚石晶体 CVD 生长的几何模型不同。通过考虑晶体阶梯流生长模型中描述的过程,我们确定了微结构生长行为的经验模型。此外,我们还证明了所开发的 CVD 生长过程适用于制备具有磁测量功能的金刚石尖端所需的膜基底。
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引用次数: 0
GaAs-on-insulator ridge waveguide nanobeam cavities with integrated InAs quantum dots 集成砷化镓量子点的砷化镓绝缘体脊波导纳米束腔
Pub Date : 2024-06-13 DOI: 10.1088/2633-4356/ad5823
Yueguang Zhou, Yuhui Yang, Yujing Wang, A. Koulas‐Simos, C. Palekar, I. Limame, Shulun Li, Hanqing Liu, H. Ni, Zhichuan Niu, Kresten Yvind, N. Gregersen, M. Pu, S. Reitzenstein
This study investigates nanobeam cavities on a GaAs-on-insulator chip with InAs quantum dots, including design, fabrication, and experimental characterization. The nanobeam cavities are optimized for high photon coupling efficiency and pronounced light-matter coupling. Numerical studies yield Q factors up to about 1400, a coupling efficiency of nearly 70% and a maximum Purcell factor of approximately 100. Experimentally, these devices have a $Q$ factor of about 1300, and comparing the lifetime of quantum dots in on-resonance and off-resonance conditions, a Purcell factor of 10.46±0.14 is obtained. Moreover, in the single-emitter regime, we observe strong multiphoton suppression with g(2)(0) = 0.295. Our results demonstrate the high potential of nanobeam cavity on a GaAs-on-insulator platform for quantum photonic applications.
本研究探讨了在带有 InAs 量子点的 GaAs-on-insulator 芯片上的纳米光束腔,包括设计、制造和实验表征。纳米光束腔经过优化,具有很高的光子耦合效率和明显的光物质耦合。数值研究得出的 Q 值系数高达约 1400,耦合效率接近 70%,最大珀塞尔系数约为 100。在实验中,这些器件的 Q$ 因子约为 1300,比较量子点在共振和非共振条件下的寿命,得出的珀塞尔因子为 10.46±0.14。此外,在单发射极体系中,我们观察到强烈的多光子抑制(g(2)(0) = 0.295)。我们的研究结果证明了在砷化镓绝缘体平台上的纳米光束腔在量子光子应用方面的巨大潜力。
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引用次数: 0
Quantum materials engineering by structured cavity vacuum fluctuations 利用结构化空腔真空波动的量子材料工程学
Pub Date : 2024-05-21 DOI: 10.1088/2633-4356/ad4e8b
Hannes Huebener, Emil Viñas~Boström, Martin Claassen, S. Latini, Angel Rubio
A paradigm shift in the research of optical cavities is taking place, focusing on the properties of materials inside cavities. The possibility to affect changes of material groundstates with or without actual photon population inside cavities is an avenue that promises a novel view of materials science and provides a new knob to control quantum phenomena in materials. Here, we present three theoretical scenarios where such groundstate quantum phase transition is predicted by the coupling of the matter to mere vacuum fluctuations of the cavity, as a realizations of cavity materials engineering in the dark.
光腔研究的模式正在发生转变,其重点是腔内材料的特性。无论空腔内是否存在实际光子群,都有可能影响材料基态的变化,这种可能性为材料科学带来了新的视角,也为控制材料中的量子现象提供了新的途径。在这里,我们提出了三种理论方案,通过物质与空腔真空波动的耦合来预测这种基态量子相变,从而实现空腔材料的黑暗工程。
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引用次数: 0
Structural formation yield of GeV centers from implanted Ge in diamond 金刚石中植入 GeV 中心的结构形成率
Pub Date : 2024-05-14 DOI: 10.1088/2633-4356/ad4b8d
Ulrich Wahl, J G Correia, Ângelo Rafael Granadeiro Costa, Afonso Lamelas, Vitor S Amaral, Karl Johnston, G. Magchiels, S. M. Tunhuma, A. Vantomme, L.M.C. Pereira
In order to study the structural formation yield of germanium-vacancy (GeV) centers from implanted Ge in diamond, we have investigated its lattice location by using the β− emission channeling technique from the radioactive isotope 75Ge (t 1/2=83 min) produced at the ISOLDE/CERN facility. 75Ge was introduced via recoil implantation following 30 keV ion implantation of the precursor isotope 75Ga (126 s) with fluences around 2×1012 - 5×1013 cm−2. While for room temperature implantation fractions around 20% were observed in split-vacancy configuration and 45% substitutional Ge, following implantation or annealing up to 900°C, the split-vacancy fraction dropped to 6-9% and the substitutional fraction reached 85-96%. GeV complexes thus show a lower structural formation yield than other impurities, with substitutional Ge being the dominant configuration. Moreover, annealing or high-temperature implantation seem to favour the formation of substitutional Ge over GeV. Our results strongly suggest that GeV complexes are thermally unstable, and transformed to substitutional Ge by capture of mobile carbon interstitials, which is likely to contribute to the difficulties in achieving high formation yields of these optically active centers.
为了研究金刚石中植入 Ge 的锗空位(GeV)中心的结构形成率,我们利用 ISOLDE/CERN 设施生产的放射性同位素 75Ge(t 1/2=83 分钟)的 β 发射通道技术研究了其晶格位置。75Ge 是在对前体同位素 75Ga 进行 30 keV 离子注入(126 秒)后,通过反冲植入法引入的,注入流量约为 2×1012 - 5×1013 cm-2。室温植入时,分空位构型的 Ge 占 20%,取代型 Ge 占 45%,而植入或退火至 900°C 后,分空位构型的 Ge 占 6-9%,取代型 Ge 占 85-96%。因此,与其他杂质相比,GeV 复合物的结构形成率较低,取代型 Ge 是主要构型。此外,退火或高温植入似乎更有利于形成取代型 Ge 而不是 GeV。我们的研究结果有力地表明,GeV 复合物热不稳定,并通过捕获移动碳间隙转化为取代型 Ge,这可能是导致这些光学活性中心难以获得高形成率的原因。
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引用次数: 0
Low-loss α-tantalum coplanar waveguide resonators on silicon wafers: fabrication, characterization and surface modification 硅晶片上的低损耗α-钽共面波导谐振器:制造、表征和表面改性
Pub Date : 2024-05-14 DOI: 10.1088/2633-4356/ad4b8c
D. Lozano, M. Mongillo, Xiaoyu Piao, S. Couet, Danny Wan, Y. Canvel, A. M. Vadiraj, T. Ivanov, J. Verjauw, R. Acharya, J. Van Damme, Mohiyaddin A. Fahd, J. Jussot, P. P. Gowda, Antoine Pacco, B. Raes, J. van de Vondel, Iuliana Radu, Bogdan Govoreanu, J. Swerts, Anton Potocnik, Kristiaan DeGreve
The performance of state-of-the-art superconducting quantum devices is currently limited by microwave dielectric loss at different interfaces. α-tantalum is a superconductor that has proven effective in reducing dielectric loss and improving device performance due to its thin low-loss oxide. Here, we demonstrate the fabrication of high-quality factor α-tantalum coplanar-waveguide resonators directly on pristine 300 mm silicon wafers over a variety of metal deposition conditions and perform a comprehensive material and electrical characterization study. Additionally, we apply a surface treatment based on hydrofluoric acid that allows us to modify different resonators surfaces, leading to a reduction in two-level system (TLS) loss in the devices by a factor of three. This loss reduction can be entirely attributed to the removal of surface oxides. Our study indicates that large scale manufacturing of low-loss superconducting circuits should indeed be feasible and suggests a viable avenue to materials-driven advancements in superconducting circuit performance.
目前,最先进的超导量子器件的性能受到不同界面上微波介质损耗的限制。α-钽是一种超导体,由于其氧化物薄、损耗低,已被证明能有效降低介质损耗并提高器件性能。在这里,我们展示了在各种金属沉积条件下直接在原始 300 毫米硅晶片上制造高质量系数 α-钽共面波导谐振器的过程,并进行了全面的材料和电气特性研究。此外,我们还采用了一种基于氢氟酸的表面处理方法,可以对不同的谐振器表面进行修饰,从而将器件中的两级系统(TLS)损耗降低了三倍。损耗的降低完全归功于表面氧化物的去除。我们的研究表明,大规模制造低损耗超导电路确实可行,并为材料驱动的超导电路性能进步提供了一条可行的途径。
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引用次数: 0
Recent progress in undoped group-IV heterostructures for quantum technologies 用于量子技术的未掺杂 IV 族异质结构的最新进展
Pub Date : 2024-02-14 DOI: 10.1088/2633-4356/ad2980
C. Tai, Jiun-Yun Li
Silicon has been a core material for digital computing owing to its high mobility, stability oxide interface, mature manufacturing technologies for more than half a century. While Moore’s law seems to further advance via various technologies to extend its expiration date, some intractable problems that requires processing times growing exponentially cannot be solved in a reasonable scale of time. Meanwhile, quantum computing is a promising tool to perform calculations much more efficiently than classical computing for certain types of problems. To realize a practical quantum computer, quantum dots on group-IV semiconductor heterostructures are promising due to the long decoherence time, scalability, and compatibility with the Si VLSI technology. In this review, we start with the advancement of group-IV undoped heterostructures since 2000 and review carrier transport properties in these undoped heterostructure. We also review the hole effective masses, spin-orbit coupling, and effective g-factors in the Ge-based heterostructures and conclude with a brief summary.
半个多世纪以来,硅凭借其高流动性、稳定的氧化物界面和成熟的制造技术,一直是数字计算的核心材料。虽然摩尔定律似乎在通过各种技术进一步推进,以延长其失效日期,但一些需要处理时间呈指数增长的棘手问题却无法在合理的时间范围内得到解决。与此同时,量子计算是一种很有前途的工具,对于某些类型的问题,它的计算效率远远高于经典计算。要实现实用的量子计算机,第四族半导体异质结构上的量子点具有退相干时间长、可扩展性强以及与硅超大规模集成电路技术兼容等优点,因此大有可为。在这篇综述中,我们首先介绍了自 2000 年以来第四族非掺杂异质结构的发展,并回顾了这些非掺杂异质结构中的载流子传输特性。我们还回顾了 Ge 基异质结构中的空穴有效质量、自旋轨道耦合和有效 g 因子,最后做了简要总结。
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引用次数: 0
Recent progress in undoped group-IV heterostructures for quantum technologies 用于量子技术的未掺杂 IV 族异质结构的最新进展
Pub Date : 2024-02-14 DOI: 10.1088/2633-4356/ad2980
C. Tai, Jiun-Yun Li
Silicon has been a core material for digital computing owing to its high mobility, stability oxide interface, mature manufacturing technologies for more than half a century. While Moore’s law seems to further advance via various technologies to extend its expiration date, some intractable problems that requires processing times growing exponentially cannot be solved in a reasonable scale of time. Meanwhile, quantum computing is a promising tool to perform calculations much more efficiently than classical computing for certain types of problems. To realize a practical quantum computer, quantum dots on group-IV semiconductor heterostructures are promising due to the long decoherence time, scalability, and compatibility with the Si VLSI technology. In this review, we start with the advancement of group-IV undoped heterostructures since 2000 and review carrier transport properties in these undoped heterostructure. We also review the hole effective masses, spin-orbit coupling, and effective g-factors in the Ge-based heterostructures and conclude with a brief summary.
半个多世纪以来,硅凭借其高流动性、稳定的氧化物界面和成熟的制造技术,一直是数字计算的核心材料。虽然摩尔定律似乎在通过各种技术进一步推进,以延长其失效日期,但一些需要处理时间呈指数增长的棘手问题却无法在合理的时间范围内得到解决。与此同时,量子计算是一种很有前途的工具,对于某些类型的问题,它的计算效率远远高于经典计算。要实现实用的量子计算机,第四族半导体异质结构上的量子点具有退相干时间长、可扩展性强以及与硅超大规模集成电路技术兼容等优点,因此大有可为。在这篇综述中,我们首先介绍了自 2000 年以来第四族非掺杂异质结构的发展,并回顾了这些非掺杂异质结构中的载流子传输特性。我们还回顾了 Ge 基异质结构中的空穴有效质量、自旋轨道耦合和有效 g 因子,最后做了简要总结。
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引用次数: 0
Growth of telecom C-band In(Ga)As quantum dots for silicon quantum photonics 用于硅量子光子学的电信 C 波段 In(Ga)As 量子点的生长
Pub Date : 2024-02-02 DOI: 10.1088/2633-4356/ad2522
Ponraj Vijayan, R. Joos, Marco Werner, Jakob Hirlinger-Alexander, Matthias Seibold, Sergej Vollmer, R. Sittig, S. Bauer, Fiona Braun, S. Portalupi, M. Jetter, P. Michler
Photonic integrated circuits based on the silicon-on-insulator platform currently allow high-density integration of optical and electro-optical components on the same chip. This high complexity is also transferred to quantum photonic integrated circuits, where non-linear processes are used for the generation of quantum light on the silicon chip. However, these intrinsically probabilistic light emission processes pose challenges to the ultimately achievable scalability. Here, an interesting solution would be employing on-demand sources of quantum light based on III-V platforms, which are nonetheless very complex to grow directly on silicon. In this paper, we show the integration of InAs quantum dots on silicon via the growth on a wafer bonded GaAs/Si template. To ensure emission in the telecom C-band (∼1550 nm), a metamorphic buffer layer approach is utilized. We show that the deposited single quantum dots show similar performance to their counterparts directly grown on the well-established GaAs platform. Our results demonstrate that on-demand telecom emitters can be directly and effectively integrated on silicon, without compromises on the performances of either the platforms
目前,基于硅绝缘体平台的光子集成电路可在同一芯片上实现光学和电子光学元件的高密度集成。量子光子集成电路也能实现这种高复杂性,在硅芯片上利用非线性过程产生量子光。然而,这些固有的概率光发射过程对最终实现可扩展性提出了挑战。在此,一种有趣的解决方案是采用基于 III-V 平台的按需量子光源,但直接在硅片上生长这种光源非常复杂。在本文中,我们展示了通过在晶圆键合砷化镓/硅模板上生长,在硅上集成砷化镓量子点的过程。为了确保在电信 C 波段(∼1550 nm)的发射,我们采用了变质缓冲层方法。我们的研究表明,沉积的单量子点与直接生长在成熟的砷化镓平台上的量子点性能相似。我们的研究结果表明,按需电信发射器可以直接有效地集成到硅上,而不会影响平台的性能。
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引用次数: 0
Inverse design and characterization of compact, broadband, and low-loss chip-scale photonic power splitters 紧凑型、宽带和低损耗芯片级光子功率分配器的逆向设计和特性分析
Pub Date : 2024-02-02 DOI: 10.1088/2633-4356/ad2521
S. Hansen,, Guillermo Arregui Bravo, A. Babar, R. Christiansen, Søren Stobbe
The scalability of integrated photonics hinges on low-loss chip-scale components, which are important for classical applications and crucial in the quantum domain. An important component is the power splitter, which is an essential building block for interferometric devices. Here, we use inverse design by topology optimization to devise a generic design framework for developing power splitters in any material platform, although we focus the present work on silicon photonics. We report on the design, fabrication, and characterization of silicon power splitters and explore varying domain sizes and wavelength spans. This results in a set of power splitters tailored for ridge, suspended, and embedded silicon waveguides with an emphasis on compact size and wide bandwidths. The resulting designs have a footprint of 2 μm x 3 μm and exhibit a remarkable 0.5-dB bandwidths exceeding 300 nm for the ridge and suspended power splitters and 600 nm for the embedded power splitter. We fabricate the power splitters in suspended silicon circuits and characterize the resulting devices using a cutback method. The experiments confirm the low excess loss, and we measure a 0.5-dB bandwidth of at least 245 nm -- limited by the wavelength range of our lasers.
集成光子学的可扩展性取决于低损耗芯片级元件,这些元件对经典应用非常重要,对量子领域也至关重要。功率分配器就是其中一个重要组件,它是干涉装置的基本构件。在这里,我们利用拓扑优化反向设计来设计一个通用设计框架,用于在任何材料平台上开发功率分配器,尽管我们目前的工作重点是硅光子学。我们报告了硅功率分配器的设计、制造和表征,并探索了不同的畴尺寸和波长跨度。最终,我们设计出了一套适用于脊状、悬浮和嵌入式硅波导的功率分配器,其重点在于紧凑的尺寸和宽带宽。这些设计的占地面积为 2 μm x 3 μm,山脊式和悬浮式功分器的 0.5 分贝带宽超过 300 nm,嵌入式功分器超过 600 nm。我们在悬浮硅电路中制造了功分器,并使用回切方法对所产生的器件进行了表征。实验证实,过量损耗很低,我们测量到的 0.5 分贝带宽至少为 245 nm,这受到我们激光器波长范围的限制。
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引用次数: 0
期刊
Materials for Quantum Technology
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