微米和四分之一微米栅极GaAs MESFET的新型MBE缓冲器

F. Smith, A. Calawa, C. Chen, L. Mahoney, M. Manfra, J.C. Huang, F. Spooner
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引用次数: 4

摘要

开发了一种新的缓冲层,消除了GaAs MESFET中的背闸,并大大减少了具有0.27-/spl mu/m长的栅极的GaAs MESFET中的短通道效应。采用分子束外延的方法,在衬底温度为200/spl℃的条件下,利用Ga和As/sub / 4两束通量生长出了新型缓冲材料。缓冲液是结晶性的,高阻性的,光学非活性的,并且可以覆盖高质量的砷化镓。栅极长度为0.27 /spl mu/m的GaAs MESFET与具有薄未掺杂GaAs缓冲器的MESFET相比,具有更好的直流和射频特性。
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New MBE Buffer For Micron And Quarter-Micron Gate GaAs MESFET's
A new buffer layer has been developed that eliminates backgating in GaAs MESFET's and substantially reduces short-channel effects in GaAs MESFET's with 0.27-/spl mu/m-long gates. The new buffer is grown by molecular beam epitaxy at a substrate temperature of 200/spl deg/C using Ga and As/sub 4/ beam fluxes. The buffer is crystalline, highly resistive, optically inactive, and can be overgrown with high quality GaAs. GaAs MESFET's with a gate length of 0.27 /spl mu/m that incorporate the new buffer show improved dc and RF properties in comparison with a similar MESFET with a thin undoped GaAs buffer.
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