{"title":"TiO2薄膜的红外吸收","authors":"M. Stamate, G. Rusu, I. Vascan","doi":"10.1117/12.312696","DOIUrl":null,"url":null,"abstract":"The titanium oxide films were deposited on glass by reactive sputtering system, in different oxygen partial pressure. In this paper we present the IR absorption of TiOx thin films, deposited through a d.c. circular magnetron system. We found several common peaks of absorption located around 500 cm-1, 530 cm-1, 582 cm-1, 638 cm-1 and 800 cm-1 that are corresponding to Ti- Ox links energy.","PeriodicalId":383583,"journal":{"name":"ROMOPTO International Conference on Micro- to Nano- Photonics III","volume":"64 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-07-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"IR absorption of TiO2 thin films\",\"authors\":\"M. Stamate, G. Rusu, I. Vascan\",\"doi\":\"10.1117/12.312696\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The titanium oxide films were deposited on glass by reactive sputtering system, in different oxygen partial pressure. In this paper we present the IR absorption of TiOx thin films, deposited through a d.c. circular magnetron system. We found several common peaks of absorption located around 500 cm-1, 530 cm-1, 582 cm-1, 638 cm-1 and 800 cm-1 that are corresponding to Ti- Ox links energy.\",\"PeriodicalId\":383583,\"journal\":{\"name\":\"ROMOPTO International Conference on Micro- to Nano- Photonics III\",\"volume\":\"64 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-07-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ROMOPTO International Conference on Micro- to Nano- Photonics III\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.312696\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ROMOPTO International Conference on Micro- to Nano- Photonics III","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.312696","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The titanium oxide films were deposited on glass by reactive sputtering system, in different oxygen partial pressure. In this paper we present the IR absorption of TiOx thin films, deposited through a d.c. circular magnetron system. We found several common peaks of absorption located around 500 cm-1, 530 cm-1, 582 cm-1, 638 cm-1 and 800 cm-1 that are corresponding to Ti- Ox links energy.
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