{"title":"具有高击穿电压和低反馈电容的假门控射频VDMOSFET","authors":"Shuming Xu, C. Ren, P. Foo, Y. Liu, Yi Su","doi":"10.1109/ISPSD.2000.856850","DOIUrl":null,"url":null,"abstract":"In this paper, a novel radio frequency power device called dummy gated VDMOS has been proposed and demonstrated experimentally. The new device is produced using the standard RF VDMOS process technology. An improvement in breakdown voltage by 20% is realized, while the feedback capacitance C/sub rss/ is reduced by three times leading to a desired HF performance and high reliability.","PeriodicalId":260241,"journal":{"name":"12th International Symposium on Power Semiconductor Devices & ICs. Proceedings (Cat. No.00CH37094)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":"{\"title\":\"Dummy gated radio frequency VDMOSFET with high breakdown voltage and low feedback capacitance\",\"authors\":\"Shuming Xu, C. Ren, P. Foo, Y. Liu, Yi Su\",\"doi\":\"10.1109/ISPSD.2000.856850\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper, a novel radio frequency power device called dummy gated VDMOS has been proposed and demonstrated experimentally. The new device is produced using the standard RF VDMOS process technology. An improvement in breakdown voltage by 20% is realized, while the feedback capacitance C/sub rss/ is reduced by three times leading to a desired HF performance and high reliability.\",\"PeriodicalId\":260241,\"journal\":{\"name\":\"12th International Symposium on Power Semiconductor Devices & ICs. Proceedings (Cat. No.00CH37094)\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-05-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"11\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"12th International Symposium on Power Semiconductor Devices & ICs. Proceedings (Cat. No.00CH37094)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISPSD.2000.856850\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"12th International Symposium on Power Semiconductor Devices & ICs. Proceedings (Cat. No.00CH37094)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISPSD.2000.856850","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Dummy gated radio frequency VDMOSFET with high breakdown voltage and low feedback capacitance
In this paper, a novel radio frequency power device called dummy gated VDMOS has been proposed and demonstrated experimentally. The new device is produced using the standard RF VDMOS process technology. An improvement in breakdown voltage by 20% is realized, while the feedback capacitance C/sub rss/ is reduced by three times leading to a desired HF performance and high reliability.
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