90nm CMOS漏极电流热噪声与射散噪声比的测量与建模

Yan Cui, G. Niu, A. Rezvani, S. S. Taylor
{"title":"90nm CMOS漏极电流热噪声与射散噪声比的测量与建模","authors":"Yan Cui, G. Niu, A. Rezvani, S. S. Taylor","doi":"10.1109/SMIC.2008.36","DOIUrl":null,"url":null,"abstract":"We present here experimental measurement and modeling of drain current thermal noise in a 90 nm CMOS technology, with a focus on its current dependence. For the first time we show experimental evidence that drain current noise in weak inversion is indeed shot-like (2ql). In saturation, drain current noise is mainly determined by the drain current, and only weakly dependent on the drain voltage. A simple model of noise is derived and compared with data. The model enables noise estimation from only DC I-V curves, and yields excellent agreement with measurement for PMOS, and acceptable agreement for NMOS.","PeriodicalId":350325,"journal":{"name":"2008 IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems","volume":"145 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Measurement and Modeling of Drain Current Thermal Noise to Shot Noise Ratio in 90nm CMOS\",\"authors\":\"Yan Cui, G. Niu, A. Rezvani, S. S. Taylor\",\"doi\":\"10.1109/SMIC.2008.36\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We present here experimental measurement and modeling of drain current thermal noise in a 90 nm CMOS technology, with a focus on its current dependence. For the first time we show experimental evidence that drain current noise in weak inversion is indeed shot-like (2ql). In saturation, drain current noise is mainly determined by the drain current, and only weakly dependent on the drain voltage. A simple model of noise is derived and compared with data. The model enables noise estimation from only DC I-V curves, and yields excellent agreement with measurement for PMOS, and acceptable agreement for NMOS.\",\"PeriodicalId\":350325,\"journal\":{\"name\":\"2008 IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems\",\"volume\":\"145 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-02-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMIC.2008.36\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMIC.2008.36","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 8

摘要

本文介绍了90纳米CMOS技术中漏极电流热噪声的实验测量和建模,重点研究了其对电流的依赖关系。我们首次展示了实验证据,证明弱反转中的漏极电流噪声确实是弹状的(2ql)。在饱和状态下,漏极电流噪声主要由漏极电流决定,对漏极电压的依赖性较弱。推导了一个简单的噪声模型,并与实测数据进行了比较。该模型可以仅从直流I-V曲线进行噪声估计,并且与PMOS的测量结果非常一致,并且与NMOS的测量结果一致。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Measurement and Modeling of Drain Current Thermal Noise to Shot Noise Ratio in 90nm CMOS
We present here experimental measurement and modeling of drain current thermal noise in a 90 nm CMOS technology, with a focus on its current dependence. For the first time we show experimental evidence that drain current noise in weak inversion is indeed shot-like (2ql). In saturation, drain current noise is mainly determined by the drain current, and only weakly dependent on the drain voltage. A simple model of noise is derived and compared with data. The model enables noise estimation from only DC I-V curves, and yields excellent agreement with measurement for PMOS, and acceptable agreement for NMOS.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Thick-Gate-Oxide MOS Structures with Sub-Design-Rule (SDR) Polysilicon Lengths for RF Circuit Applications SiC Varactor Based Tunable Filters with Enhanced Linearity Current Status and Future Trends for Si and Compound MMICs in Millimeter-Wave Regime and Related Issues for System on Chip (SOC) and/or System in Package (SIP) Applications Probing Hot Carrier Phenomena in npn and pnp SiGe HBTs Characterization and Modeling of Microstrip Transmission Lines with Slow-Wave Effect
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1