CMS中的跟踪器对齐:与像素局部重建相互作用

A. V. Barroso
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引用次数: 0

摘要

CMS硅跟踪系统测量带电粒子的轨迹,在像素探测器中达到微米级的命中分辨率,在条形探测器中达到几十微米级的命中分辨率。跟踪重建最重要的输入之一是跟踪器几何形状已知的精度。因此,必须精确地确定每个跟踪传感器的位置、方向和曲率。操作条件的变化会引起不同子结构和传感器的运动。为了保持目标精度,需要经常进行校正,确定这些校正的过程通常称为跟踪器校准。由于数据采集过程中积累的辐射,传感器的响应随时间而变化。这影响了像素点的局部重建,从而影响了对齐过程的结果。在这篇文章中,介绍了CMS中的对准过程,以及用于像素局部重建的专用校准。讨论了传感器老化引起的局部重构变化对对准过程的影响。
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Tracker alignment in CMS: interplay with pixel local reconstruction
The CMS silicon tracking system measures the trajectories of charged particles with a hit resolution of the order of microns in the pixel detector and tens of microns in the strip detector. One of the most important inputs for track reconstruction is the precision with which the tracker geometry is known. Therefore the position, orientation, and curvature of each tracker sensor must be precisely determined. Changes in the operating conditions can cause movements in the different substructures and also in the sensors. For maintaining the targeted precision, frequent corrections are needed, and the procedure to determine these corrections is commonly referred to as tracker alignment. Due to accumulated radiation during data taking, the response of the sensors changes over time. This affects the local reconstruction of pixel hits and consequently the result of the alignment procedure. In this contribution, the alignment procedure in CMS is introduced, as well as the dedicated calibration for the pixel local reconstruction. The effect of the change in the local reconstruction due to aging of the sensors on the alignment procedure is discussed.
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