O. Flament, O. Musseau, J. Leray, E. Dutisseuil, T. Corbiere
{"title":"用于高剂量应用的BiCMOS技术鉴定的电离剂量硬度保证方法","authors":"O. Flament, O. Musseau, J. Leray, E. Dutisseuil, T. Corbiere","doi":"10.1109/RADECS.1997.698888","DOIUrl":null,"url":null,"abstract":"This work concerns the development of a radiation hardness assurance methodology specially devoted to CMOS, JFET and bipolar transistors used in high total dose level environments. On the basis of recent studies, high temperature, high dose rate irradiations were performed. We propose a test procedure which combines high temperature irradiations and isochronal anneals for the qualification.","PeriodicalId":106774,"journal":{"name":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","volume":"245 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1997-09-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Ionizing dose hardness assurance methodology for qualification of a BiCMOS technology dedicated to high dose level applications\",\"authors\":\"O. Flament, O. Musseau, J. Leray, E. Dutisseuil, T. Corbiere\",\"doi\":\"10.1109/RADECS.1997.698888\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This work concerns the development of a radiation hardness assurance methodology specially devoted to CMOS, JFET and bipolar transistors used in high total dose level environments. On the basis of recent studies, high temperature, high dose rate irradiations were performed. We propose a test procedure which combines high temperature irradiations and isochronal anneals for the qualification.\",\"PeriodicalId\":106774,\"journal\":{\"name\":\"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)\",\"volume\":\"245 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1997-09-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RADECS.1997.698888\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"RADECS 97. Fourth European Conference on Radiation and its Effects on Components and Systems (Cat. No.97TH8294)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RADECS.1997.698888","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Ionizing dose hardness assurance methodology for qualification of a BiCMOS technology dedicated to high dose level applications
This work concerns the development of a radiation hardness assurance methodology specially devoted to CMOS, JFET and bipolar transistors used in high total dose level environments. On the basis of recent studies, high temperature, high dose rate irradiations were performed. We propose a test procedure which combines high temperature irradiations and isochronal anneals for the qualification.