{"title":"长波长VCSELs:全外延方法的案例","authors":"L. Coldren","doi":"10.1109/ISLC.2000.882259","DOIUrl":null,"url":null,"abstract":"For about a decade viable vertical-cavity surface emitting lasers (VCSELs) in the short wavelength 850-980 nm range have existed based upon the lattice matched InGaAs/AlGaAs/GaAs materials system. Reasonable devices extending into the visible (/spl sim/650 nm) have also been created more recently, generally using AlInGaP active layers. In most cases, devices are grown in a single epitaxial growth step, either by MBE or MOCVD approaches. In some cases, a top dielectric mirror has been employed, but the reliability of such approaches has not been fully verified. To date, all commercially successful devices have used all-epitaxial approaches. The paper reviews recent progress with the various approaches and focus in on the issues involved in the all-epitaxial approaches. From current progress, extrapolated levels of expected performance are also presented.","PeriodicalId":322366,"journal":{"name":"Conference Digest. 2000 IEEE 17th International Semiconductor Laser Conference. (Cat. No.00CH37092)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2000-09-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Long-wavelength VCSELs: the case for all-epitaxial approaches\",\"authors\":\"L. Coldren\",\"doi\":\"10.1109/ISLC.2000.882259\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"For about a decade viable vertical-cavity surface emitting lasers (VCSELs) in the short wavelength 850-980 nm range have existed based upon the lattice matched InGaAs/AlGaAs/GaAs materials system. Reasonable devices extending into the visible (/spl sim/650 nm) have also been created more recently, generally using AlInGaP active layers. In most cases, devices are grown in a single epitaxial growth step, either by MBE or MOCVD approaches. In some cases, a top dielectric mirror has been employed, but the reliability of such approaches has not been fully verified. To date, all commercially successful devices have used all-epitaxial approaches. The paper reviews recent progress with the various approaches and focus in on the issues involved in the all-epitaxial approaches. From current progress, extrapolated levels of expected performance are also presented.\",\"PeriodicalId\":322366,\"journal\":{\"name\":\"Conference Digest. 2000 IEEE 17th International Semiconductor Laser Conference. (Cat. No.00CH37092)\",\"volume\":\"12 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-09-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Conference Digest. 2000 IEEE 17th International Semiconductor Laser Conference. (Cat. No.00CH37092)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISLC.2000.882259\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Conference Digest. 2000 IEEE 17th International Semiconductor Laser Conference. (Cat. No.00CH37092)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISLC.2000.882259","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Long-wavelength VCSELs: the case for all-epitaxial approaches
For about a decade viable vertical-cavity surface emitting lasers (VCSELs) in the short wavelength 850-980 nm range have existed based upon the lattice matched InGaAs/AlGaAs/GaAs materials system. Reasonable devices extending into the visible (/spl sim/650 nm) have also been created more recently, generally using AlInGaP active layers. In most cases, devices are grown in a single epitaxial growth step, either by MBE or MOCVD approaches. In some cases, a top dielectric mirror has been employed, but the reliability of such approaches has not been fully verified. To date, all commercially successful devices have used all-epitaxial approaches. The paper reviews recent progress with the various approaches and focus in on the issues involved in the all-epitaxial approaches. From current progress, extrapolated levels of expected performance are also presented.