低能重离子束扰动敏感体厚度和临界能的估计

R. Ecoffet, S. Duzellier, J. Barak, J. Levinson, Y. Lifshitz, M. Hass, C. Inguimbert, C. Detcheverry
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引用次数: 6

摘要

低能、低量程离子被用于创造各种条件,使能量沉积在导致SEU效应的结构中。使用该方法发现一组亚微米sram和dram的敏感体积厚度范围为1至20 /spl mu/m。
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Estimation of upset sensitive volume thickness and critical energy using low energy heavy-ion beams
Low energy, low range ions are used for creating various conditions for energy deposition in structures responsible for SEU effects. Sensitive volume thicknesses found using this method for a set of sub-micronic SRAMs and DRAMs range from 1 to 20 /spl mu/m.
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