H. Kinoshita, K. Kurihara, Tutomu Mizota, Tuneyuki Haga
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Large-Area, High-Resolution Pattern Replication using a Two- Aspherical-Mirror System
The ability to replicate 0.1 μm patterns using multilayer reduction optics has already been demonstrated1),. However, if we are to exploit this technology for practical lithography of VLSI devices, the problems of large exposure area and high throughput must be solved.
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