宽线性跨导GaN HEMT的仿真

Chenjie Tang, K. Teo, J. Shi
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引用次数: 3

摘要

本文提出了一种通过引入δ掺杂层和p-GaN背势垒来实现t栅GaN hemt宽线性跨导的仿真研究。通过优化δ掺杂密度和位置,跨导(gm)和电流增益截止频率(fT)在极宽的栅极源电压(Vgs)范围内保持在峰值附近。此外,在广泛的Vgs范围内,所提出的hemt获得了较小的绝对gm3 (Ids-Vgs曲线的三阶导数)。这些特性在设计高线性RF AlGaN/GaN hemt时很有价值。
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Simulation of GaN HEMT with wide-linear-range transconductance
This paper presents a simulation study to achieve wide-linear-range transconductance of T-gate GaN HEMTs by introducing a δ-doped layer and a p-GaN back barrier. With optimized δ-doping density and location, the transconductance (gm) and current gain cutoff frequencies (fT) are ultra-flat and remain close to their peak values over a wide range of gate-source voltages (Vgs). In addition, a smaller absolute gm3 (third-order derivative of the Ids-Vgs curve) over a wide range of Vgs is obtained in proposed HEMTs. These features are valuable in designing highly linear RF AlGaN/GaN HEMTs.
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