直接比较统计损伤频率法和光栅扫描程序

G. Batavičiūtė, M. Ščiuka, V. Plerpaitė, A. Melninkaitis
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引用次数: 0

摘要

研究了在纳秒激光脉冲辐照下,纳米缺陷作为损伤前体的问题。从缺陷集成的角度研究了玻璃表面内嵌缺陷。在未涂覆熔融二氧化硅基片和SiO2单层膜两组样品上,直接比较了损伤频率法和光栅扫描法。所提取的缺陷集合似乎彼此不同。对比方法的局限性,如脉冲间激光强度的变化和激光烧蚀引起的样品污染,被认为是观察到差异的主要原因。
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Direct comparison of statistical damage frequency method and raster scan procedure
Presented study addresses the nano-size defects acting as damage precursors in nanosecond laser pulse irradiation regime. Defects embedded within the surface of glass are investigated in terms of defect ensembles. Damage frequency method and raster scan procedure are directly compared on the set of two samples: uncoated fused silica substrates and SiO2 monolayer films. The extracted defect ensembles appear to be different from each other. The limitations of compared methods such as pulse-to-pulse variation of laser intensity and sample contamination induced by laser ablation were identified as the main causes of observed differences.
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