一个65 nm, 850 MHz, 256 kbit, 4.3 pJ/access,超低泄漏功率存储器,采用动态电池稳定性和双摆数据链路

B. Rooseleer, S. Cosemans, W. Dehaene
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引用次数: 12

摘要

本文提出了一种65nm, 256 kbit的SRAM存储器,在850 MHz的速度下实现了超低漏功率和极低的有功能耗。使用的技术包括分割字和位线,本地写入感测放大器,动态单元稳定性和分布式解码器。此外,提出了三种新的技术,进一步降低了功耗。高阈值电压电池减少泄漏,提高稳定性。全局位线上的双摆信令在不影响鲁棒性的情况下减少了能量。解码器采用了一种新型的动态门,提高了解码器的速度。该设计采用低功耗65nm CMOS工艺制造。这款32位字长的256 kbit SRAM的实测性能为每次访问4.3pJ,在850 MHz速度下的泄漏功率为25.2 μW。
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A 65 nm, 850 MHz, 256 kbit, 4.3 pJ/access, ultra low leakage power memory using dynamic cell stability and a dual swing data link
This paper presents a 65nm, 256 kbit SRAM memory which achieves both ultra low leakage power and very low active energy consumption at a speed of 850 MHz. Used techniques include divided word and bitlines, local write sense amplifiers, dynamic cell stability and a distributed decoder. In addition, three novel techniques are proposed which decrease power consumption even further. High threshold voltage cells reduce leakage and improve stability. Dual swing signalling on the global bitlines reduces energy without compromising robustness. The decoder uses a new type of dynamic gate to increase speed. The design was fabricated in a low power 65nm CMOS process. Measured performance for this 256 kbit SRAM with 32 bit wordlength is 4.3pJ per access and 25.2 μW leakage power at a speed of 850 MHz.
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